半导体光电, 2016, 37 (6): 809, 网络出版: 2016-12-30
表面残留颗粒对晶圆键合影响机制的研究
Effects of Surface Residual Particles on Wafer Bonding
晶圆键合 热压键合 点压键合法 表面粗糙度 表面清洁度 wafer bonding thermocompression bonding spot pressing bonding surface roughness surface cleanliness
摘要
着重分析了晶圆表面残留颗粒对晶圆键合的影响, 并从表面残留颗粒统计意义的角度, 得到了一个晶圆键合的判定标准。为了改善键合界面出现的气泡问题, 一种基于点压技术的新型点压键合法被应用到整片键合中, 并和传统的金金热压键合法进行了比较。实验表明, 采用点压键合法能够有效抑制晶圆表面残留颗粒对晶圆键合的影响。
Abstract
The effects of residual particles on wafer bonding were analyzed, and then, a bonding criterion was proposed in the view of particles statics. In order to solve the problem of bubbles generated by residual particles on the surface, a new wafer bonding method, called Spot Pressing Bonding, was applied to the bonding of wafers, and then it was compared with the conventional Au-Au thermocompression bonding. The experimental results suggest that bubbles on the bonding interface can be reduced significantly by Spot Pressing Bonding.
许维, 王盛凯, 徐杨, 王英辉, 陈大鹏, 刘洪刚. 表面残留颗粒对晶圆键合影响机制的研究[J]. 半导体光电, 2016, 37(6): 809. XU Wei, WANG Sheng Kai, XU Yang, WANG Yinghui, CHEN Dapeng, LIU Honggang. Effects of Surface Residual Particles on Wafer Bonding[J]. Semiconductor Optoelectronics, 2016, 37(6): 809.