光电工程, 2016, 43 (12): 20, 网络出版: 2016-12-30   

TDLAS 技术用于燃烧场气体温度和浓度重建研究

2D Reconstruction for Gas Temperature and Concentration Based on TDLAS
作者单位
中国空气动力研究与发展中心,四川 绵阳 621000
摘要
基于可调谐半导体激光吸收光谱(Tunable Diode Laser Absorption Spectroscopy, TDLAS)技术及修正型代数迭代算法(Algebraic Reconstruction Technique, ART),选择频率为7 153.7 cm-1 和7 154.3 cm-1 的H2O 吸收线作为测温谱线,测量了CH4/Air 预混平面火焰炉燃烧场温度和H2O 气浓度分布。仿真采用1 000 pixels×1 000 pixels 个像素点描述方形模型区域,假设40 条光束从两个方向正交通过重建区域,通过引入初始分布并经修正型ART 算法计算和三次多项式插值处理,温度场重建偏差在4.5%以内,H2O 气浓度场重建偏差在4%以内。实验采用导轨和转台实现探测光对稳态燃烧场两个方向上的平行扫描,共获取24 路光束吸收信号,经修正型ART 算法重建和三次多项式插值处理得到整个火焰炉燃烧区域的温度场和H2O 气浓度场分布。将温度场重建结果与热电偶的测量结果进行对比,表明该方法能够有效实现燃烧场温度二维重建。
Abstract
7 153.7cm-1 and 7 154.3cm-1 absorption light spectrums of H2O vapor were chosen to measure temperature distributions and H2O vapor concentration distributions of the combustion region of CH4/Air flat flame furnace based on Tunable Diode Absorption Spectroscopy (TDLAS) and modified Algebraic Reconstruction Technique (ART). In the numerical simulation, combustion region was described by 1 000 pixels×1 000 pixels. There were 40 laser rays cross the combustion region in orthogonal two directions. By introducing the initial distribution, we found the temperature field reconstruction relative error was less than 4.5% and H2O vapor concentration field reconstruction relative error was less than 4% based on modified ART algorithm and cubic polynomial interpolation processing. In the experiment, 24 laser rays were used to scan the target region of CH4/Air flat flame furnace in orthogonal two directions with rotary table and slide way. Temperature field and H2O vapor concentration field were obtained based on modified ART algorithm and cubic polynomial interpolation. A comparison of temperature reconstruction result and thermo couple result indicates the method is effective to achieve temperature field reconstruction of the combustion region.

殷可为, 胥頔, 张龙, 杨富荣. TDLAS 技术用于燃烧场气体温度和浓度重建研究[J]. 光电工程, 2016, 43(12): 20. YIN Kewei, XU Di, ZHANG Long, YANG Furong. 2D Reconstruction for Gas Temperature and Concentration Based on TDLAS[J]. Opto-Electronic Engineering, 2016, 43(12): 20.

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