介绍了制备光学合成石英玻璃的常用工艺方法, 包括化学气相沉积、等离子化学气相沉积和间接合成法等; 给出了不同光学石英玻璃使用的原材料、它们的特点及其在不同领域的应用综述了该项技术在国内外的发展现状。比较了上述制备方法的优缺点, 其中立式化学气相沉积工艺是目前最成熟的商业化工艺, 可用于制备直径达Φ600 mm以上、光学均匀性优于2×10-6、抗激光损伤阈值达30 J/cm2@355 nm的大尺寸合成石英玻璃; 等离子化学气相沉积工艺可制备内在质量优异、羟基含量≤5×10-6、光谱透过率T190-4000 nm≥80%的全光谱透过石英玻璃; 间接合成法可制备光吸收系数小于1×10-6/cm@1064 nm、羟基含量≤1×10-6、光谱透过率T157-4000 nm≥80%的石英玻璃, 而且易于掺杂及控制缺陷, 进而制备各类掺杂特殊功能的石英玻璃。文章最后指出: 上述制备工艺各有优缺点, 应根据高端光电技术领域的应用需求采取适当的制备工艺。

Several kinds of important preparation processes of synthetic optical silica glass are elaborated, such as Chemical Vapor Deposition (CVD), Plasma Chemical Vapor Deposition (PCVD) and indirect synthetic method. The raw materials and characteristics for the optical silica glass, as well their applications in different fields are given. Then, developing situations and tendencies of these preparation processes are reviewed. It compares their advantages and shortcomings in detail. Among them, the CVD is the most mature and commercial technology. It prepares the synthetic silica glass with a diameter of 600 mm or beyond, its optical uniformity is better than 2×10-6, and the laser damage threshold is 30 J/cm2@355 nm. The PCVD processes synthetic silica glass of full-spectrum transmittance. It shows excellent internal quality, its hydroxyl content is less than 5×10-6, and the spectral transmittance of T190-4000 nm is more than 80%. Furthermore, the indirect synthetic method prepares the synthetic silica glass with an absorption coefficient less than 1×10-6/cm@1064 nm, its hydroxyl content is less than 1×10-6, and the spectral transmittance of T157-4000 nm is more than 80%. Moreover, the indirect synthetic method is beneficial to doping and controlling the defects of synthetic silica glass, which achieves all kinds of special functional silica glass. It suggests that each of these preparation processes of synthetic optical silica glass has its own advantages and disadvantages, so proper preparation processes could be adopted for different application requirements of modern high-end photoelectron technological fields.