Chinese Optics Letters, 2017, 15 (6): 062401, Published Online: Jul. 20, 2018  

Optical rectification and Pockels effect as a method to detect the properties of Si surfaces Download: 997次

Author Affiliations
1 State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012, China
2 College of Communication Engineering, Jilin University, Changchun 130012, China
3 College of Information Technology, Jilin Agricultural University, Changchun 130118, China
4 State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
Abstract
The depth profile of electric-field-induced (EFI) optical rectification (OR) and EFI Pockels effect (PE) in a Si(110) crystal are investigated. The results show that EFI OR and PE signals are very sensitive to the electric field strength in the surface layers of the Si crystal. Theoretical formulas that include the electric field parameters and the widths of the space-charge region are presented and agreed very well with the experimental results. The experiments and simulations indicate that EFI OR and PE are potential methods for researching the surface/interface properties along the depth direction in centrosymmetric crystals such as Si.

Qi Wang, Li Zhang, Xin Wang, Haiyan Quan, Zhanguo Chen, Jihong Zhao, Xiuhuan Liu, Lixin Hou, Yanjun Gao, Gang Jia, Shaowu Chen. Optical rectification and Pockels effect as a method to detect the properties of Si surfaces[J]. Chinese Optics Letters, 2017, 15(6): 062401.

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