光学仪器, 2017, 39 (1): 68, 网络出版: 2017-04-10  

退火温度对二氧化钛薄膜的性能影响

The influence of the annealing temperature on the properties of titanium dioxide thin film
作者单位
上海理工大学 光电信息与计算机工程学院, 上海 200093
摘要
为了获得性能优良的二氧化钛薄膜,采用电子束蒸发沉积方法制备二氧化钛薄膜,并分别在300、600、900 ℃空气中对样品进行退火处理以改善所制备二氧化钛薄膜的性能。分别采用X射线衍射(XRD)、原子力显微镜(AFM)以及分光光度计研究了退火温度对二氧化钛薄膜结构和光学性能的影响。结果表明,退火处理可以使二氧化钛薄膜由非晶态薄膜转换为金红石型薄膜,且金红石晶型成分随退火温度的加大而增大,同时退火处理可以改善二氧化钛薄膜在300~1 200 nm光谱范围的总吸光率以及增大二氧化钛薄膜的应用范围。
Abstract
In order to obtain good performance of titanium dioxide thin film,this experiment used electron beam evaporation deposition method to fabricate titanium films.Then the films were annealed at 300 degrees,600 degrees,and 900 degrees to improve the performance of the preparation of titanium dioxide thin film.X-ray diffraction(XRD),atomic force microscope(AFM) and spectrophotometer were used respectively to study the influence of structure and optical properties of titanium oxide film.The results show that the model of the film at room temperature was amorphous but the films after annealing transformed to rutile which is proportional to the annealing temperature.Annealing could also improve the total light absorption of the titanium dioxide thin film in the 300~1 200 nm spectral range.Annealing treatment could broaden the application of titanium dioxide thin film.

潘长锦, 张大伟, 王健, 卢忠荣. 退火温度对二氧化钛薄膜的性能影响[J]. 光学仪器, 2017, 39(1): 68. PAN Changjin, ZHANG Dawei, WANG Jian, LU Zhongrong. The influence of the annealing temperature on the properties of titanium dioxide thin film[J]. Optical Instruments, 2017, 39(1): 68.

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!