Chinese Optics Letters, 2017, 15 (7): 071403, Published Online: Jul. 20, 2018  

Micro-channel etching characteristics enhancement by femtosecond laser processing high-temperature lattice in fused silica glass Download: 951次

Author Affiliations
The State Key Laboratory of High Performance Complex Manufacturing, College of Mechanical and Electrical Engineering, Central South University, Changsha 410083, China
Abstract
A fused silica glass micro-channel can be formed by chemical etching after femtosecond laser irradiation, and the successful etching probability is only 48%. In order to improve the micro-channel fabrication success probability, the method of processing a high-temperature lattice by a femtosecond laser pulse train is provided. With the same pulse energy and scanning speed, the success probability can be increased to 98% by optimizing pulse delay. The enhancement is mainly caused by the nanostructure, which changes from a periodic slabs structure to some intensive and loose pore structures. In this Letter, the optimum pulse energy distribution ratio to the etching is also investigated.

Dongkai Chu, Xiaoyan Sun, Youwang Hu, Xinran Dong, Kai Yin, Zhi Luo, Jianying Zhou, Cong Wang, Ji'an Duan. Micro-channel etching characteristics enhancement by femtosecond laser processing high-temperature lattice in fused silica glass[J]. Chinese Optics Letters, 2017, 15(7): 071403.

引用该论文: TXT   |   EndNote

相关论文

加载中...

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!