Collection Of theses on high power laser and plasma physics, 2015, 13 (1): 95320C, Published Online: May. 27, 2017  

Laser Induced Damage of SiO2 and CaF2 under 263 nm

Author Affiliations
1 National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, 201800 China
2 University of Chinese Academy of Sciences, Beijing, 100049 China
3 Shanghai Institute of Laser Plasma, Chinese Academy of Engineer Physics, Shanghai, 201800, China
Abstract
Laser damage performance of large aperture optical components has been study under fourth harmonic of 1053nm Nd:glass laser irradiation (263nm).The threshold of optical components is very low under 263nm laser irradiation ,due to conversion of beam to higher energy photons of the quadrupled frequency (4ω), and is relative to material characteristic. A preliminary test of laser induced damage in fused silica (SiO2) and CaF2under 263nm laser is reported in this article. Thresholds of these two materials are obtained. Laser damage threshold of SiO2 is found about 2 J/cm2 by 1-on-1 method using pulsed 263nm laser, lower than CaF2 whose threshold.

Xiuqing Jiang, Dong Liu, Lailin Ji, Shunxing Tang, Yajing Guo, Baoqiang Zhu, Yanqi Gao, Zunqi Lin. Laser Induced Damage of SiO2 and CaF2 under 263 nm[J]. Collection Of theses on high power laser and plasma physics, 2015, 13(1): 95320C.

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