Collection Of theses on high power laser and plasma physics, 2011, 9 (1): 4226, Published Online: Jun. 2, 2017  

Characteristics of plasma scalds in multilayer dielectric films

Author Affiliations
1 Key Laboratory of High Power Laser Materials, Shanghai Institute of Optics and Fine Mechanics, Shanghai 201800, China
2 Shanghai Institute of Laser Plasma, Shanghai 201800, China
Abstract
Plasma scalding is one of the most typical laser damage morphologies induced by a nanosecond laser with a wavelength of 1053nm in HfO2=SiO2 multilayer films. In this paper, the characteristics of plasma scalds are systematically investigated with multiple methods. The scalding behaves as surface discoloration under a microscope. The shape is nearly circular when the laser incidence angle is close to normal incidence and is elliptical at oblique incidence. The nodular-ejection pit is in the center of the scalding region when the laser irradiates at the incidence angle close to normal incidence and in the right of the scalding region when the laser irradiates from left to right at oblique incidence. The maximum damage size of the scalding increases with laser energy. The edge of the scalding is high compared with the unirradiated film surface, and the region tending to the center is concave. Plasma scald is proved to be surface damage. The maximum depth of a scald increases with its size. Tiny pits of nanometer scale can be seen in the scalding film under a scanning electronic microscope at a higher magnification. The absorptions of the surface plasma scalds tend to be approximately the same as the lower absorptions of test sites without laser irradiation. Scalds do not grow during further illumination pulses until 65 J=cm2. The formation of surface plasma scalding may be related to the occurrence of the laser-supported detonation wave.

Xiaofeng Liu, Yuan’an Zhao, Dawei Li, Guohang Hu, Yanqi Gao, Zhengxiu Fan, Jianda Shao. Characteristics of plasma scalds in multilayer dielectric films[J]. Collection Of theses on high power laser and plasma physics, 2011, 9(1): 4226.

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!