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改性抛光剂对光学玻璃抛光质量的影响

Effect of Modified Polishing Agent on Polishing Quality of Optical Glass

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摘要

为了抑制抛光粉纳米颗粒的团聚, 改善抛光液的性能, 使光学玻璃获得更高的抛光速率与更低的表面粗糙度, 在氧化铈抛光液中添加阴离子表面活性剂梅迪兰, 研究了梅迪兰质量分数对抛光液中粒子粒径、分散性以及材料去除率和抛光后光学玻璃表面粗糙度的影响。结果表明: 微量梅迪兰能显著改善抛光液中粒子的分散性, 抑制纳米粒子的团聚, 提高抛光液的质量; 当梅迪兰质量分数为0~0.32%时, 随着质量分数增大, 化学机械抛光速率先增大后减小, 当质量分数为0.26%时达到最大值122 nm/min; 玻璃的表面粗糙度随着梅迪兰质量分数增加而先减小后增大, 在质量分数为0.13%时达到最小值0.928 nm。

Abstract

To restrain agglomeration of nanoparticles in polishing powders and improve properties of polishing slurry, so as to achieve better polishing properties of optical glass such as polishing rate, surface roughness and so on, we add a kind of anionic surfactant Medialan into ceria polishing slurry and study the effects of Medialan mass fraction on size and dispersion of particles, and material removal rate, as well as surface roughness of polished optical glass. The results show that the addition of trace Medialan can significantly improve dispersion of particles in the polishing slurry, restrain agglomeration of ceria particles, and improve quality of the polishing slurry. When the mass fraction of Medialan is between 0 and 0.32%, the chemico-mechanical polishing rate increases firstly and then decreases with the increase of Medialan mass fraction. When the mass fraction of Medialan is 0.26%, the chemico-mechanical polishing rate reaches the maximum value of 122 nm/min. The surface roughness firstly decreases and then increases with the increase of Medialan mass fraction, and the surface roughness reaches the minimum value of 0.928 nm when the mass fraction of Medialan is 0.13%.

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中图分类号:TG356.28

DOI:10.3788/cjl201744.1203001

所属栏目:材料与薄膜

基金项目:国家国际科技合作专项项目(2010DFB70490)

收稿日期:2017-07-28

修改稿日期:2017-08-28

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梁尚娟:中国科学院上海光学精密机械研究所高功率激光物理联合实验室, 上海 201800中国科学院大学, 北京 100049上海科技大学物质科学与技术学院, 上海 201210
汤文龙:中国科学院上海光学精密机械研究所高功率激光物理联合实验室, 上海 201800中国科学院大学, 北京 100049
焦翔:中国科学院上海光学精密机械研究所高功率激光物理联合实验室, 上海 201800
朱健强:中国科学院上海光学精密机械研究所高功率激光物理联合实验室, 上海 201800上海科技大学物质科学与技术学院, 上海 201210

联系人作者:朱健强(jqzhu@mail.shcnc.ac.cn)

备注:梁尚娟(1992-), 女, 硕士研究生, 主要从事光学玻璃加工、化学机械抛光氧化铈抛光粉方面的研究。

【1】Shao Ping, Xia Lan, Zhao Dongfeng, et al. Measurement and debugging of wedge-shaped lens in high power laser facility[J]. Chinese J Lasers, 2015, 42(4): 0408006.
邵平, 夏兰, 赵东峰, 等. 高功率激光装置终端楔形透镜的测量与调试[J]. 中国激光, 2015, 42(4): 0408006.

【2】Pan Xingchen, Tao Hua, Liu Cheng, et al. Application of iterative algorithm based on phase modulation in high power laser facilities[J]. Chinese J Lasers, 2016, 43(1): 0108001.
潘兴臣, 陶华, 刘诚, 等. 基于相位调制的单次曝光波前测量在高功率激光驱动器中的应用[J]. 中国激光, 2016, 43(1): 0108001.

【3】Xu Qiao, Wang Jian, Ma Ping, et al. Progress of advanced optical manufactuing technology[J]. High Power Laser and Particle Beams, 2013, 25(12): 3098-3105.
许乔, 王健, 马平, 等. 先进光学制造技术进展[J]. 强激光与粒子束, 2013, 25(12): 3098-3105.

【4】Zhang X, Zhou W, Dai W J, et al. Surface phase defects induced downstream laser intensity modulation in high-power laser facility[J]. High Power Laser Science and Engineering, 2016, 4(1): e6.

【5】Rambo P, Schwarz J, Kimmel M, et al. Development of high damage threshold laser-machined apodizers and gain filters for laser applications[J]. High Power Laser Science and Engineering, 2016, 4(3): e32.

【6】Liu H J, Feng Z Y, Huang X W, et al. Study on purification and application of novel precipitant for ceria-based polishing powder[J]. Journal of Rare Earths, 2013, 31(2): 174-179.

【7】Salleh S, Sudin I, Awang A. Effects of non-spherical colloidal silica slurry on Al-NiP hard disk substrate CMP application[J]. Applied Surface Science, 2016, 360: 59-68.

【8】Hong J, Liu X H, Liu Y L, et al. Removal rate and surface quality of the GLSI silicon substrate during the CMP process[J]. Microelectronic Engineering, 2017, 168: 76-81.

【9】Peedikakkandy L, Kalita L, Kavle P, et al. Preparation of spherical ceria coated silica nanoparticle abrasives for CMP application[J]. Applied Surface Science, 2015, 357: 1306-1312.

【10】Tsai T H, Yen S C. Localized corrosion effects and modifications of acidic and alkaline slurries on copper chemical mechanical polishing[J]. Applied Surface Science, 2003, 210(3/4): 190-205.

【11】Wang Y G, Zhang L C, Biddut A. Chemical effect on the material removal rate in the CMP of silicon wafers[J]. Wear, 2011, 270(3/4): 312-316.

【12】Lim G, Lee J H, Kim J, et al. Effects of oxidants on the removal of tungsten in CMP process[J]. Wear, 2004, 257(9/10): 863-868.

【13】Lee D W, Kim N H, Chang E G. Effect of nonionic surfactants on the stability of alumina slurry for Cu CMP[J]. Materials Science and Engineering: B, 2005, 118(1/2/3): 293-300.

【14】Asghar K, Qasim M, Nelabhotla D M, et al. Effect of surfactant and electrolyte on surface modification of c-plane GaN substrate using chemical mechanical planarization (CMP) process[J]. Colloids and Surfaces A, 2016, 497: 133-145.

【15】Penta N K, Amanapu H P, Peethala B C, et al. Use of anionic surfactants for selective polishing of silicon dioxide over silicon nitride films using colloidal silica-based slurries[J]. Applied Surface Science, 2013, 283: 986-992.

【16】Zhao Yadong, Liu Yuling, Luan Xiaodong, et al. Effect of polishing pressure and surfactant on the uniformity in copper CMP[J]. Semiconductor Technology, 2017, 42(2): 119-123, 152.
赵亚东, 刘玉岭, 栾晓东, 等. 抛光压力与表面活性剂对铜CMP均匀性的影响[J]. 半导体技术, 2017, 42(2): 119-123, 152.

【17】Zhang Z F, Liu W L, Song Z T. Particle size and surfactant effects on chemical mechanical polishing of glass using silica-based slurry[J]. Applied Optics, 2010, 49(28): 5480-5485.

【18】Zhang Z F, Liu W L, Song Z T. Effect of abrasive particle concentration on preliminary chemical mechanical, polishing of glass substrate[J]. Microelectronic Engineering, 2010, 87(11): 2168-2172.

【19】Wu Yuanyuan, Yi Shouzhi, Wei Zhijie, et al. Study on suspension property and redispersibility of CeO2 slurry[J]. China Powder Science and Technology, 2015, 21(2): 57-60.
吴媛媛, 衣守志, 魏志杰, 等. 氧化铈抛光液悬浮性和再分散性研究[J]. 中国粉体技术, 2015, 21(2): 57-60.

引用该论文

Liang Shangjuan,Tang Wenlong,Jiao Xiang,Zhu Jianqiang. Effect of Modified Polishing Agent on Polishing Quality of Optical Glass[J]. Chinese Journal of Lasers, 2017, 44(12): 1203001

梁尚娟,汤文龙,焦翔,朱健强. 改性抛光剂对光学玻璃抛光质量的影响[J]. 中国激光, 2017, 44(12): 1203001

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