为了获得低成本、高结晶度的红荧烯薄膜, 采用溶液加工的方法和聚合物界面修饰层研究了红荧烯薄膜的性质。首先, 通过旋涂方法在Si/SiO2衬底上先沉积一层聚乙烯吡咯烷酮(PVP)作为界面修饰层, 利用偏光显微镜(POM)、原子力显微镜(AFM)研究了PVP层表面形貌及粗糙度。接着在PVP上滴涂红荧烯溶液后固化烘干, 制备红荧烯晶体薄膜, 研究了不同PVP浓度和不同成膜温度下界面修饰层对红荧烯表面形貌的影响。然后, 利用X射线衍射(XRD)表征对比研究了薄膜的微观结构。最后, 分析了红荧烯晶体薄膜的生长机制。实验结果表明: 80~140 ℃及低浓度的PVP条件下能得到结晶度高、连续的红荧烯球晶, 并且温度升高时, 球晶尺寸变大。PVP作为界面修饰层有利于改善红荧烯的成膜性, 制备高结晶度的晶体薄膜。

In order to obtain the low cost and high crystalline thin films, the properties of rubrene films were investigated with Polyvinyl Pyrrolidone (PVP) as interface modification layer on the Si/SiO2 substrate by solution process. First, PVP films were spin-coated on Si/SiO2 substrate. The surface morphology and roughness (RMS) of PVP layer were analyzed by polarizing optical microscope (POM) and atomic force microscopy (AFM). Then, rubrene films were drop-coated on the PVP layer and dried out. The effects of PVP layer with the different PVP concentration and film-forming temperature on rubrene morphology were studied. The crystal structures of PVP films and rubrene films were carried out by X-ray diffraction. Finally, growth mechanism mode of rubrene films on the PVP interface modification layer was proposed. The results indicate that the temperature of 80－140 ℃ and lower concentration of PVP are apt to prepare spherulites with high crystallinity, and the crystals size becomes larger when the temperature increases. PVP used as interface modification layer is beneficial to improve film-forming property of rubrene and prepare crystalline films with high crystallinity.