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基于DOE的TFT-LCD切换残影不良改善研究

Improvement of TFT-LCD image-retention based on DOE

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摘要

为降低TFT-LCD生产过程中切换残影不良的发生率, 在考虑残影的主要影响因素基础上, 采用实验设计(DOE) 中的部分因子实验设计筛选该不良的显著因子, 结合生产实际开展切换残影的改善研究工作。研究结果表明: DOE方法能有效辨别残影不良的显著因子有覆盖层(Over coater, OC)、重叠部分(ITO-Vcom Overlay, OL)和摩擦扭转力(Rubbing Torque), 在实际生产的不良改善过程中, 彩膜玻璃(Color Filter, CF)增加OC、加大OL和提高Rubbing Torque值均能有效降低残影不良发生率; 研究结果为切换残影和改善TFT-LCD生产过程中其他不良提供了新思路。

Abstract

To reduce the occurrence of TFT-LCD image-retention, several key factors were approved with fractional factorial design adopting the design of experiment (DOE). Through the practical production, we solved the problem about the image-retention. The results showed that the prominent factors of image-retention, including OC, OL and Rubbing Torque, can be effectively distinguished by DOE method. Moreover, by adding OC on CF,enlarging and ITO-Vcom Overlay, or increasing Rubbing Torque value, the incidence of image-retention during improvement can be effectively reduced. This study provided a new idea for other defect researches in image-retention and TFT-LCD production process.

Newport宣传-MKS新实验室计划
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中图分类号:TN141.9

DOI:10.3788/yjyxs20183302.0123

所属栏目:材料与器件

收稿日期:2017-06-26

修改稿日期:2017-10-27

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作者单位    点击查看

陶 雄:重庆京东方光电科技有限公司, 重庆 400714
王云志:重庆京东方光电科技有限公司, 重庆 400714
李 莹:重庆京东方光电科技有限公司, 重庆 400714
杨德波:重庆京东方光电科技有限公司, 重庆 400714
何云川:重庆京东方光电科技有限公司, 重庆 400714

联系人作者:陶雄(taoxiong@boe.com.cn)

备注:陶雄(1989-), 男, 云南丘北人, 硕士研究生, 主要从事液晶显示面板的新产品导入和不良解析相关工作。

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引用该论文

TAO Xiong,WANG Yun-zhi,LI Ying,YANG De-bo,HE Yun-chuan. Improvement of TFT-LCD image-retention based on DOE[J]. Chinese Journal of Liquid Crystals and Displays, 2018, 33(2): 123-128

陶 雄,王云志,李 莹,杨德波,何云川. 基于DOE的TFT-LCD切换残影不良改善研究[J]. 液晶与显示, 2018, 33(2): 123-128

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