激光与光电子学进展, 2018, 55 (4): 040201, 网络出版: 2018-09-11
应用于芯片原子钟的微碱金属气室制备与研究 下载: 1142次
Fabrication and Study of Micro Alkali-Metal Vapor Cell Applied to Chip Scale Atomic Clock
原子与分子物理学 芯片原子钟 碱金属气室 饱和吸收 感应耦合等离子体 阳极键合 atomic and molecular physics chip scale atomic clock alkali-metal vapor cell saturated absorption inductively coupled plasma anodic bonding
摘要
利用感应耦合等离子体深硅刻蚀机与阳极键合机,制备出了应用于芯片原子钟的碱金属气室。以AZ4620光刻胶为硅片掩模,研究了深硅刻蚀后硅表面的形貌特征,对比了不同结构下深硅刻蚀速率。经过阳极键合,获得了三明治结构的微碱金属气室,并检测其饱和吸收谱线。实验结果表明:制备出的微碱金属气室在温度为80 ℃条件下出现明显的饱和吸收现象。
Abstract
By using the inductively coupled plasma (ICP) deep silicon etching machine and the anodic bonding system, the alkali-metal vapor cell applied to the chip scale atomic clock (CSAC) is fabricated. With the AZ4620 photoresist as a mask, the silicon surface morphology after deep silicon etching is studied and the deep silicon etching rates under different structures are compared. The micro alkali-metal vapor cell with a sandwich structure is obtained by using the anodic bonding, and the saturation absorption line is detected. The experimental results show that a significant saturated absorption phenomenon is observed in the fabricated micro alkali-metal vapor cell when the temperature is 80 ℃.
汤跃, 任子明, 李云超, 胡旭文, 张彦军, 闫树斌. 应用于芯片原子钟的微碱金属气室制备与研究[J]. 激光与光电子学进展, 2018, 55(4): 040201. Yue Tang, Ziming Ren, Yunchao Li, Xuwen Hu, Yanjun Zhang, Shubin Yan. Fabrication and Study of Micro Alkali-Metal Vapor Cell Applied to Chip Scale Atomic Clock[J]. Laser & Optoelectronics Progress, 2018, 55(4): 040201.