采用直流磁控溅射法,以柔性PET(聚对苯二甲酸乙二醇酯)为基底,通过参数优化以求在室温下制备高性能ZnO/Ag/ZnO 多层薄膜。实验中,使用X射线衍射仪(XRD)、原子力显微镜(AFM)、紫外可见分光光度计、四探针电阻测试仪等仪器分别对ZnO/Ag/ZnO多层薄膜的微观结构、表面形貌、透过率及方块电阻进行测试及表征。结果表明,随着Ag层厚度增加,薄膜方块电阻急剧下降,通过改变ZnO层厚度,可有效调节薄膜光学性能,随着ZnO层厚度增加,可见光区平均透过率先增大后减小。引入品质因子FTC作为评价指标可知,当依次沉积ZnO、Ag、ZnO厚度为50 nm、8 nm、50 nm时,薄膜光电性能最佳,其在可见光平均透过率为82.3%、方块电阻为2.8 Ω/□、禁带宽度为3.332 eV。

The high-performance ZnO/Ag/ZnO multilayers are prepared by direct current(DC) magnetron sputtering on a flexible polyethylene terephthalate(PET) as substrate at room temperature and optimized by changing parameters.The microstructure,surface morphology,optical transmittance and sheet resistance of multilayers were measured by X-ray diffraction(XRD),atomic force microscopy(AFM),UV-VIS spectrophotometer and four-probe resistance tester,respectively.The results show that the sheet resistance decreases rapidly with the increase of the Ag layer thickness.The optical properties can be adjusted effectively by changing the thickness of ZnO layer.The average transmittance of the visible region increases firstly and then decreases with the increase of the Ag layer thickness.The quality factor FTC was introduced as the evaluation index.As the thickness of ZnO and Ag is 50nm and 8nm respectively,the photoelectric performance of multilayers is optimal.The average transmittance of visible light is 83.2%.The sheet resistance is 2.4 ohm/sq and the optical energy band gap is 3.332 eV.