为了探究二氧化钛(TiO2)薄膜表面粗糙度的影响因素,利用离子束辅助沉积电子束热蒸发技术对不同基底粗糙度以及相同基底粗糙度的K9玻璃完成二氧化钛(TiO2)光学薄膜的沉积。采用TalySurf CCI非接触式表面轮廓仪分别对镀制前基底表面粗糙度和镀制后薄膜表面粗糙度进行测量。实验表明,TiO2薄膜表面粗糙度随着基底表面的增大而增大,但始终小于基底表面粗糙度,说明TiO2薄膜具有平滑基地表面粗糙的作用；随着沉积速率的增大,薄膜表面粗糙度先降低后趋于平缓；对于粗糙度为2 nm的基底,离子束能量大小的改变影响不大,薄膜表面粗糙度均在1.5 nm左右；随着膜层厚度的增大,薄膜表面粗糙度先下降后升高。

In order to investigate the influencing factors on the surface roughness of titanium dioxide (TiO2) films, deposition of titanium dioxide (TiO2) films on K9 glass with different and the same substrate roughness was completed by ion beam assisted deposition electron beam thermal evaporation.The surface roughness of substrate and film were measured by TalySurf CCI non-contact surface profiler.The experimental results show that the surface roughness of TiO2 film increases with the increase of substrate surface,but is always less than the substrate surface roughness,indicating that TiO2 film has the function of smoothing base surface roughness.With the increase of deposition rate, the surface roughness of film decreases firstly and then tends to be smooth.For the substrate with a roughness of 2 nm, the change of the energy of the ion beam has little effect, and the surface roughness of the film is about 1.5 nm.With the increase of film thickness, the surface roughness of film decreases firstly and then increases.