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光刻机照明光场均匀性高精度校正方法研究

High Precision Correction Method of Illumination Field Uniformity for Photolithography Illumination System

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摘要

提出了应用于光刻机照明系统照明光场均匀性的高精度校正方法,该方法通过优化手指阵列式均匀性校正器中校正手指前端的形状及其排布方式来提高校正能力和精度。仿真结果表明:当校正手指错开排布时,手指阵列式均匀性校正器的校正精度优于0.2%;当校正手指的前端有倒斜角且双层错开排布时,手指阵列式均匀性校正器的校正精度优于0.16%,比常规手指阵列式均匀性校正器的校正精度提高约一倍。

Abstract

A high precision correction method of illumination field uniformity for photolithography illumination system is proposed. The correction ability and accuracy are improved by the optimization of the fingers′ fore-end shape and arrangement of the finger array uniformity corrector. The simulation results show that the correction accuracy of the finger array uniformity corrector is better than 0.2%, when fingers are staggered arrangement. In addition, the correction accuracy of the finger array uniformity corrector is better than 0.16%, when fingers are chamfered, staggered and double layouts arrangement, which is about twice as high as general finger array uniformity corrector.

Newport宣传-MKS新实验室计划
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中图分类号:O435.1

DOI:10.3788/aos201838.0722001

所属栏目:光学设计与制造

基金项目:上海市科技人才计划(14YF1406300)、政府间国际科技创新合作重点专项(2016YFE0110600)、上海市国际科技合作基金(16520710500)、中国科学院青年创新促进会资助项目、上海市科技人才计划(17YF1429500)

收稿日期:2018-01-08

修改稿日期:2018-02-27

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作者单位    点击查看

程伟林:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800中国科学院大学, 北京 100049
张方:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800
林栋梁:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800中国科学院大学, 北京 100049
曾爱军:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800中国科学院大学, 北京 100049
杨宝喜:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800中国科学院大学, 北京 100049
黄惠杰:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800中国科学院大学, 北京 100049

联系人作者:黄惠杰(huanghuijie@siom.ac.cn)

备注:程伟林(1986-),男,博士研究生,助理研究员,主要从事光学光刻技术方面的研究。E-mail: chengweilin@siom.ac.cn

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引用该论文

Cheng Weilin,Zhang Fang,Lin Dongliang,Zeng Aijun,Yang Baoxi,Huang Huijie. High Precision Correction Method of Illumination Field Uniformity for Photolithography Illumination System[J]. Acta Optica Sinica, 2018, 38(7): 0722001

程伟林,张方,林栋梁,曾爱军,杨宝喜,黄惠杰. 光刻机照明光场均匀性高精度校正方法研究[J]. 光学学报, 2018, 38(7): 0722001

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