首页 > 论文 > 液晶与显示 > 33卷 > 6期(pp:469-474)

Rubbing Mura产生机理及改善研究

Principle and improvement research of rubbing Mura

  • 摘要
  • 论文信息
  • 参考文献
  • 被引情况
  • PDF全文
分享:

摘要

Rubbing Mura是以接触式摩擦工艺生产TFT_LCD产品时常见的顽固缺陷,尤其在HADS产品上不良发生率更高。本文对Rubbing Mura产生的原因及机理进行分析,发现该不良由TFT基板上的源极线(Source Data,SD)附近的Rubbing弱区漏光引起。研究了Rubbing强度(Nip值)、Rubbing布型号、Rubbing布寿命、黑矩阵(Black Matrix,BM)加宽和SD减薄对HADS产品的Rubbing Mura的影响,选择最优的工艺条件,Rubbing Mura的不良发生率由2.4%降至0%,改善效果明显。

Abstract

Rubbing Mura is a common defect in the production of TFT_LCD with contact rubbing process, especially in the high advanced super dimension switch (HADS) production. This paper analyzes the causes and mechanism of the Rubbing Mura, and finds that it is caused by the leakage of light from the weak zone of rubbing near the Source Data (SD). Further analysis has been done by comparing the rubbing strength (Nip value), rubbing cloth model, rubbing cloth life, black matrix (BM) widening and SD thinning. The ratio of rubbing Mura has been reduced from 2.4% to 0% under the most optimal process condition, and the effect of the improvements is quite obvious.

Newport宣传-MKS新实验室计划
补充资料

中图分类号:TN141.9

DOI:10.3788/yjyxs20183306.0469

所属栏目:材料与器件

收稿日期:2018-01-08

修改稿日期:2018-02-27

网络出版日期:--

作者单位    点击查看

杨德波:重庆京东方光电科技有限公司,重庆 400714
王云志:重庆京东方光电科技有限公司,重庆 400714
陶 雄:重庆京东方光电科技有限公司,重庆 400714
李 伟:重庆京东方光电科技有限公司,重庆 400714
钟 野:重庆京东方光电科技有限公司,重庆 400714
罗 春:重庆京东方光电科技有限公司,重庆 400714

联系人作者:杨德波(yangdebo@boe.com.cn)

备注:杨德波(1989-),男,贵州遵义人,硕士,中级工程师,主要从事液晶显示面板的产品良率监管、不良解析及改善工作。

【1】张龙,陈霖东,江桥,等.非接触式配向工艺(光配向工艺)Zara Particle不良产生机理分析及改善方向研究[J].电子世界,2017(11):117-119.
ZHANG L, CHEN L D, JIANG Q, et al. Principle and improving research of Zara Particle of non-contact rubbing process (Photo-Alignment process) [J]. Electronics World, 2017(11): 117-119. (in Chinese)

【2】申智源.TFT-LCD技术:结构、原理及制造技术[M].北京:电子工业出版社,2012.
SHEN Z Y. TFT -LCD Technology: Structure, Principle and Manufacturing Techniques [M]. Beijing: Publishing House of Electronics Industry, 2012. (in Chinese)

【3】张鹏,马婷婷,杨叶花,等.液晶显示器Mura缺陷及测量方法浅析[J].电子测试,2017(6):50-52.
ZHANG P, MA T T, YANG Y H, et al. Mura defect and measurement method of liquid crystal display [J]. Electronic Test, 2017(6): 50-52. (in Chinese)

【4】ZHANG W, SONG S H, LIJ, et al. Analysis of rubbing Mura in fringe field switching liquid crystal display [J]. SID Symposium Digest of Technical Papers, 2013, 44(1): 1122-1125.

【5】高荣荣,姚成宜,叶超前,等.关于TN型TFT-LCD中周边Mura的分析与改善[J].电子世界,2014(18):160.
GAO RR, YAO C Y, YE C Q, et al. Analysis and improvement of Edge Mura in TN type TFT – LCD [J]. Electronics World, 2014(18): 160. (in Chinese)

【6】石天雷,杨国波,刘亮,等.ODF工艺用封框胶的研究[J].光电子技术,2011,31(3):211-214.
SHI T L, YANG G B, LIU L, et al. The research of sealant used in ODF process [J]. Optoelectronic Technology, 2011, 31(3): 211-214. (in Chinese)

【7】毕昕,丁汉.TFT-LCD Mura缺陷机器视觉检测方法[J].机械工程学报,2010,46(12):13-19.
BI X, DING H. Machine vision inspection method of Mura defect for TFT-LCD [J]. Journal of Mechanical Engineering,2010, 46(12): 13-19. (in Chinese)

【8】TSAI J Z, CHANG R S, LI TY. Detection of gap Mura in TFT LCDs by the interference pattern and image sensing method [J]. IEEE Transactions on Instrumentation and Measurement, 2013, 62(11): 3087-3092.

【9】桑胜光,车晓盼,王嘉黎,等.高PPI ADS产品白Mura不良产生原理及改善研究[J].液晶与显示,2016,31(5):435-441.
SANG S G, CHE X P, WANG J L, et al. Principle and improving research of white mura defect in high PPI ADS product [J]. Chinese Journal of Liquid Crystals and Displays, 2016, 31(5): 435-441. (in Chinese)

引用该论文

YANG De-bo,WANG Yun-zhi,TAO Xiong,LI Wei,ZHONG Ye,LUO Chun. Principle and improvement research of rubbing Mura[J]. Chinese Journal of Liquid Crystals and Displays, 2018, 33(6): 469-474

杨德波,王云志,陶 雄,李 伟,钟 野,罗 春. Rubbing Mura产生机理及改善研究[J]. 液晶与显示, 2018, 33(6): 469-474

您的浏览器不支持PDF插件,请使用最新的(Chrome/Fire Fox等)浏览器.或者您还可以点击此处下载该论文PDF