液晶与显示, 2018, 33 (6): 469, 网络出版: 2018-07-31   

Rubbing Mura产生机理及改善研究

Principle and improvement research of rubbing Mura
作者单位
重庆京东方光电科技有限公司,重庆 400714
摘要
Rubbing Mura是以接触式摩擦工艺生产TFT_LCD产品时常见的顽固缺陷,尤其在HADS产品上不良发生率更高。本文对Rubbing Mura产生的原因及机理进行分析,发现该不良由TFT基板上的源极线(Source Data,SD)附近的Rubbing弱区漏光引起。研究了Rubbing强度(Nip值)、Rubbing布型号、Rubbing布寿命、黑矩阵(Black Matrix,BM)加宽和SD减薄对HADS产品的Rubbing Mura的影响,选择最优的工艺条件,Rubbing Mura的不良发生率由2.4%降至0%,改善效果明显。
Abstract
Rubbing Mura is a common defect in the production of TFT_LCD with contact rubbing process, especially in the high advanced super dimension switch (HADS) production. This paper analyzes the causes and mechanism of the Rubbing Mura, and finds that it is caused by the leakage of light from the weak zone of rubbing near the Source Data (SD). Further analysis has been done by comparing the rubbing strength (Nip value), rubbing cloth model, rubbing cloth life, black matrix (BM) widening and SD thinning. The ratio of rubbing Mura has been reduced from 2.4% to 0% under the most optimal process condition, and the effect of the improvements is quite obvious.

杨德波, 王云志, 陶雄, 李伟, 钟野, 罗春. Rubbing Mura产生机理及改善研究[J]. 液晶与显示, 2018, 33(6): 469. YANG De-bo, WANG Yun-zhi, TAO Xiong, LI Wei, ZHONG Ye, LUO Chun. Principle and improvement research of rubbing Mura[J]. Chinese Journal of Liquid Crystals and Displays, 2018, 33(6): 469.

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