红外与激光工程, 2018, 47 (6): 0621002, 网络出版: 2018-09-08  

热处理对双离子束溅射SiO2薄膜力学及热力学特性的影响

Influence of thermal annealing on mechanical and thermoelastic characteristics of SiO2 films produced by DIBS
作者单位
天津市薄膜光学重点实验室 天津津航技术物理研究所, 天津 300300
摘要
光学薄膜的力学及热力学特性决定了光学系统性能的优劣。采用双离子束溅射的方法在硅<110>和肖特石英Q1基底上制备了SiO2薄膜, 并对制备的膜层进行退火处理。系统研究了热处理前后SiO2薄膜的力学及热力学特性。研究结果表明, 750 ℃退火条件下SiO2薄膜的弹性模量(Er)增加到72 GPa, 膜层硬度增加到10 GPa。镀完后未经退火处理的SiO2薄膜表现为压应力, 但是应力值在退火温度达到450 ℃以上时急剧降低, 说明热处理有助于改善SiO2薄膜内应力。经退火处理的SiO2薄膜泊松比(vf)为0.18左右。退火前后SiO2薄膜的杨氏模量(Ef)都要比石英块体材料大, 并且750 ℃退火膜层杨氏模量增加了50 GPa以上。550 ℃退火的SiO2薄膜热膨胀系数(αf)从6.78×10-7 ℃-1降到最小值5.22×10-7 ℃-1。
Abstract
Mechanical and thermoelastic charecteristics of optical films are important to ensure the performance of optical coating systems. SiO2 films were prepared by dual ion beam sputtering (DIBS) on Si <110> and Schott Q1. The mechanical and thermoelastic properties of films as-deposited and annealed were systematically investigated. The results show that reduced Young′s modulus (Er) is elevated to 72 GPa while the film was annealed at 750 ℃, and hardness (H) increases to over 10 GPa. The as-deposited films show compressive stress and the stress could be dramatically released while annealed over 450 ℃, incicating that heat treatment could improve the internal stress of SiO2 film. Poisson′s ratio (vf) of annealed SiO2 films is around 0.18, and Young′s modulus (Ef) of as-deposited and annealed films is larger than that of fused silica, and elevated over 50 GPa while annealed at 750 ℃. Thermal expansion coefficient (αf) decreases from 6.78×10-7 ℃-1 to the minimum value 5.22×10-7 ℃-1 while annealed at 550 ℃.

冷健, 季一勤, 刘华松, 庄克文, 刘丹丹. 热处理对双离子束溅射SiO2薄膜力学及热力学特性的影响[J]. 红外与激光工程, 2018, 47(6): 0621002. Leng Jian, Ji Yiqin, Liu Huasong, Zhuang Kewen, Liu Dandan. Influence of thermal annealing on mechanical and thermoelastic characteristics of SiO2 films produced by DIBS[J]. Infrared and Laser Engineering, 2018, 47(6): 0621002.

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