光学学报, 2018, 38 (10): 1022004, 网络出版: 2019-05-09
光刻机照明系统的多自由度均匀性校正方法 
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Multi-Degree-of-Freedom Uniformity Correction Method of Illumination System in Lithography Machine
光学设计 光刻机 照明系统 多自由度均匀性校正 optical design lithography machine illumination system multi-degree-of-freedom uniformity correction
摘要
提出了一种光刻机照明系统的多自由度均匀性校正方法。当照明光瞳的部分相干因子发生变化时,该方法的校正手指只需整体在光轴方向进行微调就能使照明光场的均匀性满足要求。仿真分析了校正手指的三维空间移动对照明光场均匀性的影响,并验证了该方法的高效性。
Abstract
A multi-degree-of-freedom uniformity correction method of the illumination system in a lithography machine is proposed. When the partial coherence factor of the illumination pupil changes, the fine tuning of the whole correction fingers along the direction of the optical axis in the proposed method is enough to make the light illumination uniformity meet the requirements. The effect of the three-dimensional spatial movement of correction fingers on the light illumination uniformity is analyzed by simulation, and the high efficiency of this method is verified.
程伟林, 张方, 林栋梁, 曾爱军, 杨宝喜, 黄惠杰. 光刻机照明系统的多自由度均匀性校正方法[J]. 光学学报, 2018, 38(10): 1022004. Weilin Cheng, Fang Zhang, Dongliang Lin, Aijun Zeng, Baoxi Yang, Huijie Huang. Multi-Degree-of-Freedom Uniformity Correction Method of Illumination System in Lithography Machine[J]. Acta Optica Sinica, 2018, 38(10): 1022004.
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