半导体光电, 2018, 39 (5): 682, 网络出版: 2019-01-10
膜厚对泡沫镍负载TiO2纳米薄膜附着度和光电响应的影响
Effects of Film Thickness on The Adhesion and Photoelectric Response of TiO2 Film Deposited on Nickel Foam
摘要
采用溶胶凝胶法与高温水热法相结合的复合方法制备了以泡沫镍为基底的不同膜层厚度的TiO2纳米薄膜光电极, 并用场发射扫描电子显微镜(SEM)与电化学工作站对样品进行了表面形貌表征与光电性能测试。结果表明, 膜层厚度为10层的TiO2纳米薄膜光电极的材料附着度最高, 且具有最强的光电响应。研究结果为进一步优化泡沫镍负载TiO2纳米薄膜光电极的制备提供了有益参考。
Abstract
Combining the hydrothermal method with the solgel method, TiO2 nano film photoelectrodes with different film thickness were prepared with nickel foam as the substrate. The surface morphology and photoelectrical properties of the samples were measured by SEM and electrochemical workstation. The results indicate that the samples with 10 TiO2 layers show the highest photoelectric response and also the best material adhesion.
王雅琨, 刘明生, 李燕, 杨新荣. 膜厚对泡沫镍负载TiO2纳米薄膜附着度和光电响应的影响[J]. 半导体光电, 2018, 39(5): 682. WANG Yakun, LIU Mingsheng, LI Yan, YANG Xinrong. Effects of Film Thickness on The Adhesion and Photoelectric Response of TiO2 Film Deposited on Nickel Foam[J]. Semiconductor Optoelectronics, 2018, 39(5): 682.