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TFT-LCD工艺中角落白Mura的成因机理研究与改善

Research and improvement of corner white Mura in TFT-LCD

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摘要

在新产品导入过程中会突发各种Mura类不良。本文为解决TV机种导入中出现的一种原因未知的角落白Mura,首先进行了大量的排查和推理,初步判定异常来源于成盒工艺(Cell)段,利用气相色谱(GC)、高效液相色谱(HPLC)设备测试并对比了角落白Mura区域与正常区域的液晶纯度、液晶组份和框胶溶出的差异,最后探讨了其形成的机理。结果表明角落白Mura区域液晶组份发生较大变动,液晶组份挥发是角落白Mura产生的主因。通过优化贴合时的真空抽气时间、真空保持时间、液晶滴下点数、液晶与边框胶距离等一系列的改善措施,使产品的角落白Mura发生率从16.59 %降到了0.001%以下管控范围。实验有效解决了角落白Mura异常并为今后类似Mura类不良的对策提供了思路,同时提升了公司的效益和竞争力。

Abstract

At present, a variety of sudden Mura phenomena always appear in the process of introducing new products. In this paper, in order to solve the problem of a new unknown corner white Mura which happened in TV product process, a lot of investigation and reasoning work are carried out, firstly. Preliminary, we estimate the Mura is derived from the Cell segment. We measure the liquid crystal purity, the liquid crystal component and the sealant dissolubility difference of the Mura region by using gas chromatography (GC) and high performance liquid chromatography (HPLC). Comparing with the normal region, the formation mechanism is discussed. The results show that the liquid crystal components change a lot in the corner white Mura area and the main cause of corner white Mura is the volatilization of liquid crystal components. By taking a series of improvement measures such as optimizing vacuum extraction time, vacuum holding time, liquid crystal drop points, the distance between liquid crystal and sealant and so on, the rate of corner white Mura is decreased from 1659% to below 0.001%. Our experiments effectively solve the problem of corner white Mura abnormity and provide some methods to solving similar Mura's countermeasures in the future. At the same time, our company’s efficiency and competitiveness are promoted.

Newport宣传-MKS新实验室计划
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中图分类号:TN141.9

DOI:10.3788/yjyxs20183307.0583

所属栏目:材料与器件

收稿日期:2018-01-05

修改稿日期:2018-04-02

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作者单位    点击查看

王绍华:南京中电熊猫平板显示科技有限公司Cell技术部,江苏 南京 210046
吴 飞:南京中电熊猫平板显示科技有限公司Cell技术部,江苏 南京 210046
宣 津:南京中电熊猫平板显示科技有限公司Cell技术部,江苏 南京 210046
陈 辉:南京中电熊猫平板显示科技有限公司Cell技术部,江苏 南京 210046
陈 超:南京中电熊猫平板显示科技有限公司Cell技术部,江苏 南京 210046
侯德智:南京中电熊猫平板显示科技有限公司Cell技术部,江苏 南京 210046
周 皇:南京中电熊猫平板显示科技有限公司Cell技术部,江苏 南京 210046

联系人作者:王绍华(wangshaohua@ncpd.com.cn)

备注:王绍华(1989-),男,安徽阜阳人,硕士研究生,工程师,2014年于安徽大学获得硕士学位,主要从事TFT-LCD方面的工艺研究和改善工作。

【1】王新久.液晶光学和液晶显示[M].北京: 科学出版社,2006: 106-109.
WANG X J. Liquid Crystal Optics & Liquid Crystal Display [M]. Beijing: Science Press, 2006: 106-109. (in Chinese)

【2】吴洪江,王威,龙春平.一种TFT-LCD Vertical Block Mura的研究与改善[J].液晶与显示,2007,22(4): 433-439.
WU H J, WANG W, LONG C P, et al. Research and improvement about Vertical Block Mura in TFT-LCD process [J]. Chinese Journal of Liquid Crystals and Displays, 2007, 22(4): 443-439. (in Chinese)

【3】焦峰,王海宏.TFT-LCD残像原理与分析(基础篇)[J].现代显示,2012,23(4): 54-59.
JIAO F, WANG H H. The theory and analysis of TFT-LCD image sticking (Basis) [J]. Advanced Display, 2012, 23(4): 54-59. (in Chinese)

【4】焦峰,王海宏.TFT-LCD残像原理与分析-加强篇一[J].现代显示,2012,23(5): 16-20.
JIAO F, WANG H H. The theory and analysis of TFT-LCD image sticking-Upgrade I[J]. Advanced Display, 2012, 23(5): 16-20. (in Chinese)

【5】张龙,朱健,吴璟,等.磁控溅射制备低应力金属膜的工艺研究[J].中国机械工程,2005,16(14): 1313-1315.
ZHANG L, ZHU J, WU J, et al. Making low-stress metal thin films with magnetron sputtering [J]. China Mechanical Engineering, 2005, 16(4): 1313-1315. (in Chinese)

【6】马群刚.TFT-LCD原理与设计[M].北京: 电子工业出版社,2011: 12,45-47.
MA Q G. Principle and Design of TFT-LCD [M]. Beijing: Publishing House of Electronics Industry, 2011: 12, 45-47. (in Chinese)

【7】徐伟,彭毅雯,雷有华,等.TFT-LCD横向线状未确认Mura分析及改善研究[J].液晶与显示,2013,28(4): 539-546.
XU W, PENG Y W, LEI Y H, et al. Analysis and improvement of TFT-LCD horizontal line unknown Mura [J]. Chinese Journal of Liquid Crystals and Displays, 2013, 28(4): 539-546. (in Chinese)

【8】YAMADA S, KIMURA S, SAKAI N, et al. A new production of the large size TFT-panel by “LC-dropping method” [J].SID Symposium Digest of Technical Papers, 2001, 32(1): 1350-1353.

【9】石天雷,杨国波,刘亮,等.ODF工艺用封框胶的研究[J].光电子技术,2011,31(3): 211-214.
SHI T L, YANG G B, LIU L, et al. The research of Sealant used in ODF process [J]. Optoelectronic Technology, 2011, 31(3): 211-214. (in Chinese)

【10】杨国波,王永茂,赵军,等.ODF工艺的进展[J].光机电信息,2011,28(1): 23-27.
YANG G B, WANG Y M, ZHAO J, et al. Development of ODF process [J]. OME Information, 2011, 28(1): 23-27. (in Chinese)

引用该论文

WANG Shao-hua,WU Fei,XUAN Jin,CHEN Hui,CHEN Chao,HOU De-zhi,ZHOU Huang. Research and improvement of corner white Mura in TFT-LCD[J]. Chinese Journal of Liquid Crystals and Displays, 2018, 33(7): 583-589

王绍华,吴 飞,宣 津,陈 辉,陈 超,侯德智,周 皇. TFT-LCD工艺中角落白Mura的成因机理研究与改善[J]. 液晶与显示, 2018, 33(7): 583-589

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