光学学报, 2018, 38 (12): 1202001, 网络出版: 2019-05-10
原子光刻中原子通量的优化研究 下载: 746次
Optimization of Atom Flux in Atom Lithography
原子与分子物理学 纳米计量 传递标准 原子光刻 纳米光栅 原子通量 atomic and molecular physics nanoscale metrology transfer standards atom lithography nanoscale gratings atom flux
摘要
原子通量是影响原子光刻技术制备纳米光栅质量的主要因素之一。应用原子炉管喷发量的理论模型,利用理论与实验相结合的方法,对比研究了三类典型原子炉管构型下的原子通量水平,并基于最优原子炉管构型将研制的铬纳米光栅峰谷高度提升到100 nm,使光栅质量得到进一步优化。
Abstract
Atom flux is one of the main factors influencing the quality of nano-gratings fabricated by atom lithography. Based on the theoretical model of eruption volume of atomic furnace tube, the atom flux levels for three typical kinds of furnace tubes are compared by the combination of theory and experiment. Moreover, with the best furnace tube configuration, the peak to valley height of the fabricated Cr nano-gratings increases up to 100 nm, which further optimizes the quality of nano-gratings.
陈杰, 刘杰, 朱立, 邓晓, 程鑫彬, 李同保. 原子光刻中原子通量的优化研究[J]. 光学学报, 2018, 38(12): 1202001. Jie Chen, Jie Liu, Li Zhu, Xiao Deng, Xinbin Cheng, Tongbao Li. Optimization of Atom Flux in Atom Lithography[J]. Acta Optica Sinica, 2018, 38(12): 1202001.