首页 > 论文 > 光学学报 > 38卷 > 12期(pp:1202001--1)

原子光刻中原子通量的优化研究

Optimization of Atom Flux in Atom Lithography

  • 摘要
  • 论文信息
  • 参考文献
  • 被引情况
  • PDF全文
分享:

摘要

原子通量是影响原子光刻技术制备纳米光栅质量的主要因素之一。应用原子炉管喷发量的理论模型,利用理论与实验相结合的方法,对比研究了三类典型原子炉管构型下的原子通量水平,并基于最优原子炉管构型将研制的铬纳米光栅峰谷高度提升到100 nm,使光栅质量得到进一步优化。

Abstract

Atom flux is one of the main factors influencing the quality of nano-gratings fabricated by atom lithography. Based on the theoretical model of eruption volume of atomic furnace tube, the atom flux levels for three typical kinds of furnace tubes are compared by the combination of theory and experiment. Moreover, with the best furnace tube configuration, the peak to valley height of the fabricated Cr nano-gratings increases up to 100 nm, which further optimizes the quality of nano-gratings.

Newport宣传-MKS新实验室计划
补充资料

中图分类号:O562

DOI:10.3788/aos201838.1202001

所属栏目:原子与分子物理学

基金项目:国家重点研发计划(2016YFA0200902)、国家重大科学仪器设备开发专项(2014YQ090709)

收稿日期:2018-06-14

修改稿日期:2018-07-23

网络出版日期:2018-07-25

作者单位    点击查看

陈杰:同济大学物理科学与工程学院, 上海 200092
刘杰:同济大学物理科学与工程学院, 上海 200092
朱立:同济大学物理科学与工程学院, 上海 200092
邓晓:同济大学物理科学与工程学院, 上海 200092
程鑫彬:同济大学物理科学与工程学院, 上海 200092
李同保:同济大学物理科学与工程学院, 上海 200092

联系人作者:邓晓(1110490dengxiao@tongji.edu.cn); 陈杰(1310571@tongji.edu.cn);

【1】Li T B. Nanometrology and transfer standard[J]. Shanghai Measurement and Testing, 2005, 32(1): 8-13.
李同保. 纳米计量与传递标准[J]. 上海计量测试, 2005, 32(1): 8-13.

【2】Yi L F, Xiong X M, Zhang W T, et al. Analysis of three-dimensional deposition characteristics of chromium atoms in the straight edge diffraction standing wave field[J]. Acta Optica Sinica, 2017, 37(6): 0614004.
伊路福, 熊显名, 张文涛, 等. 直边衍射驻波场中铬原子三维沉积特性分析[J]. 光学学报, 2017, 37(6): 0614004.

【3】McClelland J J, Scheinfein M R. Laser focusing of atoms: a particle-optics approach[J]. Journal of the Optical Society of America B, 1991, 8(9): 1974-1986.

【4】Ekstrom C R, Keith D W, Pritchard D E. Atom optics using microfabricated structures[J]. Applied Physics B, 1992, 54(5): 369-374.

【5】McClelland J J, Scholten R E, Palm E C, et al. Laser-focused atomic deposition[J]. Science, 1993, 262(5135): 877-880.

【6】Ma Y, Li T B, Wu W, et al. Laser-focused atomic deposition for nanoscale grating[J]. Chinese Physics Letters, 2011, 28(7): 073202.

【7】McClelland J J, Hill S B, Pichler M, et al. Nanotechnology with atom optics[J]. Science and Technology of Advanced Materials, 2004, 5(5/6): 575-580.

【8】Deng X, Liu J, Zhu L, et al. Natural square ruler at nanoscale[J]. Applied Physics Express, 2018, 11(7): 075201.

【9】Bjorkholm J E, Freeman R R, Ashkin A, et al. Observation of focusing of neutral atoms by the dipole forces of resonance-radiation pressure[J]. Physical Review Letters, 1978, 41(20): 1361-1364.

【10】Timp G, Behringer R E, Tennant D M, et al. Using light as a lens for submicron, neutral-atom lithography[J]. Physical Review Letters, 1992, 69(11): 1636-1639.

【11】McGowan R W, Giltner D M, Lee S A. Light force cooling, focusing, and nanometer-scale deposition of aluminum atoms[J]. Optics Letters, 1995, 20(24): 2535-2537.

【12】Ohmukai R, Urabe S, Watanabe M. Atom lithography with ytterbium beam[J]. Applied Physics B, 2003, 77(4): 415-419.

【13】te Sligte E, Smeets B, van der Stam K M R, et al. Atom lithography of Fe[J]. Applied Physics Letters, 2004, 85(19): 4493-4495.

【14】McClelland J J, Celotta R J. Laser-focused atomic deposition-nanofabrication via atom optics[J]. Thin Solid Films, 2000, 367(1/2): 25-27.

【15】Dalibard J, Cohen-Tannoudji C. Laser cooling below the Doppler limit by polarization gradients: simple theoretical models[J]. Journal of the Optical Society of America B, 1989, 6(11): 2023-2045.

【16】Wen X, Zhang Y Y, Qian J. Lensing effect induced by a Bose-Einstein condensate passing a Gaussian laser field[J]. Laser & Optoelectronics Progress, 2017, 54(11): 110201.
温歆, 张钰伊, 钱静. 玻色-爱因斯坦凝聚体穿越高斯光场的透镜效应[J]. 激光与光电子学进展, 2017, 54(11): 110201.

【17】McClelland J J, Gupta R, Jabbour Z J, et al. Laser focusing of atoms for nanostructure fabrication[J]. Australian Journal of Physics, 1996, 49(2): 555-565.

【18】Dushman S, Brown S C. Scientific foundations of vacuum technique[J]. American Journal of Physics, 1962, 30(8): 612.

【19】Brandes E A. Smithells metals reference book[M]. 6th ed. London: Butterworths, 1983.

【20】Smith K F. Molecular beams[M]. New York: John Wiley & Sons, 1955.

【21】Zhang B W, Li T B, Ma Y. One-dimensional Doppler laser collimation of chromium beam with a novel pre-collimating scheme[J]. Chinese Optics Letters, 2008, 6(10): 782-784.

【22】McClelland J J, Anderson W R, Bradley C C, et al. Accuracy of nanoscale pitch standards fabricated by laser-focused atomic deposition[J]. Journal of Research of the National Institute of Standards and Technology, 2003, 108(2): 99-113.

【23】Zhang W J, Ma Y, Li T B, et al. Structured mirror array for two-dimensional collimation of a chromium beam in atom lithography[J]. Chinese Physics B, 2013, 22(2): 228-231.

引用该论文

Chen Jie,Liu Jie,Zhu Li,Deng Xiao,Cheng Xinbin,Li Tongbao. Optimization of Atom Flux in Atom Lithography[J]. Acta Optica Sinica, 2018, 38(12): 1202001

陈杰,刘杰,朱立,邓晓,程鑫彬,李同保. 原子光刻中原子通量的优化研究[J]. 光学学报, 2018, 38(12): 1202001

您的浏览器不支持PDF插件,请使用最新的(Chrome/Fire Fox等)浏览器.或者您还可以点击此处下载该论文PDF