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周边配向膜Mura改善研究

Improvement of peripheral PI Mura

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摘要

在大世代线液晶面板厂,因产品切换便捷、产能高等优势,配向膜材料涂布多采用喷墨印刷方式。但随着高分辨率、无边框等技术升级,喷墨印刷方式面临的挑战也随之增加,产生了很多新的配向膜不良。本文研究了一种周边配向膜Mura,分析原因为阵列基板上的配向膜固化时,在基板周边过孔处出现堆积,造成周边显示区配向膜厚不均匀,导致显示区边缘形成暗线不良。文章从配向膜边界位置、预固化温度、预固化环境气压和配向膜膜厚4个方面进行分析实验,证明了外扩配向膜边界、降低预固化温度、降低预固化环境气压和降低配向膜膜厚,可以有效减轻配向膜在周边过孔处堆积,进而成功解决此不良,获得优异的显示品质。

Abstract

In large generation LCD factory, Inkjet printing is widely used for PI (Polyimide alignment film) material coating,due to convenient product switching and high capacity . As the technology upgrading, such as high PPI, Borderless etc., the challenges of novel PI Mura occurred in inkjet printing process. We research a kind of peripheral PI Mura in this paper. In Pre-cure process, PI solution was accumulated much near the peripheral via Hole of array glass,leading to larger inhomogeneous film thickness, which caused the edge dark line mura . We research the process conditions of PI pattern position, Pre-cure temperature, Pre-cure air pressure and PI Thickness. The results reveal that extending edge of PI pattern, lowering Pre-cure temperature, reducing the air pressure and thinning the film effectively decrease accumulation near the peripheral via hole, and induce the defect-free and excellent display

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中图分类号:TN141.9

DOI:10.3788/yjyxs20183310.0831

所属栏目:材料与器件

收稿日期:2018-05-13

修改稿日期:2018-08-04

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作者单位    点击查看

徐长健:北京京东方显示技术有限公司,北京 100176
陆顺沙:北京京东方显示技术有限公司,北京 100176
马国靖:北京京东方显示技术有限公司,北京 100176
王丹:北京京东方显示技术有限公司,北京 100176
任锦宇:北京京东方显示技术有限公司,北京 100176
周波:北京京东方显示技术有限公司,北京 100176
宋勇志:北京京东方显示技术有限公司,北京 100176
陈维涛:北京京东方显示技术有限公司,北京 100176
冯莎:北京京东方显示技术有限公司,北京 100176

联系人作者:徐长健(xuchangjian@boe.com.cn)

备注:徐长健(1990-),男,吉林四平人,学士,工程师,主要从事TFT-LCD Panel 材料与工艺研发。E-mail: xuchangjian@boe.com.cn

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引用该论文

XU Chang-jian,LU Shun-sha,MA Guo-jing,WANG Dan,REN Jin-yu,ZHOU Bo,SONG Yong-zhi,CHEN Wei-tao,FENG Sha. Improvement of peripheral PI Mura[J]. Chinese Journal of Liquid Crystals and Displays, 2018, 33(10): 831-835

徐长健,陆顺沙,马国靖,王丹,任锦宇,周波,宋勇志,陈维涛,冯莎. 周边配向膜Mura改善研究[J]. 液晶与显示, 2018, 33(10): 831-835

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