液晶与显示, 2018, 33 (10): 831, 网络出版: 2018-12-18   

周边配向膜Mura改善研究

Improvement of peripheral PI Mura
作者单位
北京京东方显示技术有限公司,北京 100176
摘要
在大世代线液晶面板厂,因产品切换便捷、产能高等优势,配向膜材料涂布多采用喷墨印刷方式。但随着高分辨率、无边框等技术升级,喷墨印刷方式面临的挑战也随之增加,产生了很多新的配向膜不良。本文研究了一种周边配向膜Mura,分析原因为阵列基板上的配向膜固化时,在基板周边过孔处出现堆积,造成周边显示区配向膜厚不均匀,导致显示区边缘形成暗线不良。文章从配向膜边界位置、预固化温度、预固化环境气压和配向膜膜厚4个方面进行分析实验,证明了外扩配向膜边界、降低预固化温度、降低预固化环境气压和降低配向膜膜厚,可以有效减轻配向膜在周边过孔处堆积,进而成功解决此不良,获得优异的显示品质。
Abstract
In large generation LCD factory, Inkjet printing is widely used for PI (Polyimide alignment film) material coating,due to convenient product switching and high capacity . As the technology upgrading, such as high PPI, Borderless etc., the challenges of novel PI Mura occurred in inkjet printing process. We research a kind of peripheral PI Mura in this paper. In Pre-cure process, PI solution was accumulated much near the peripheral via Hole of array glass,leading to larger inhomogeneous film thickness, which caused the edge dark line mura . We research the process conditions of PI pattern position, Pre-cure temperature, Pre-cure air pressure and PI Thickness. The results reveal that extending edge of PI pattern, lowering Pre-cure temperature, reducing the air pressure and thinning the film effectively decrease accumulation near the peripheral via hole, and induce the defect-free and excellent display

徐长健, 陆顺沙, 马国靖, 王丹, 任锦宇, 周波, 宋勇志, 陈维涛, 冯莎. 周边配向膜Mura改善研究[J]. 液晶与显示, 2018, 33(10): 831. XU Chang-jian, LU Shun-sha, MA Guo-jing, WANG Dan, REN Jin-yu, ZHOU Bo, SONG Yong-zhi, CHEN Wei-tao, FENG Sha. Improvement of peripheral PI Mura[J]. Chinese Journal of Liquid Crystals and Displays, 2018, 33(10): 831.

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