为了满足空间光电系统对复合探测的需求, 本文针对一种波导栅极薄膜空间复合探测用微通道光电倍增结构展开制备工艺方法研究.从微通道板光电倍增和空间电子束分流调制的角度出发, 阐述波导栅极薄膜复合探测器件工作原理以及在制备过程中的约束条件;为了确定栅极结构的制备特性参数, 依据适用于低能电子在多元介质中发生散射的物理模型, 分别研究了栅极复合薄膜膜层厚度、入射电子能量对波导栅极薄膜中入射电子渡越轨迹的影响;通过汲水法获取自支撑有机隔离薄膜采用优化电阻热蒸发镀膜技术,实现了波导栅极薄膜的纳米尺度制备, 并利用可视化的手段对其复合膜层结构予以表征; 最后, 从复合探测功能角度在专用真空测试系统中验证了该栅极薄膜复合器件的可行性.

In order to satisfy the complex detection demand of space optoelectronic systems, a prepared method of waveguide-gate film electron multiplying structure based on micro channel plates applied in the field of space complex detection was proposed. From the view point of photomultiplication of micro-channel plates and modulation and distributary of space electron beam, operation principles of this detector and some constraints during the preparation process are explained. After the effects of different incident beam energies and different thickness of gate films on trajectories of incident electrons in waveguide-gate films are respectively studied on the basis of a physical model from scattering of low-energy incident electronics in multiplex dielectrics, process characteristic parameters of the gate are targeted in the range by simulation results. A free-standing organic film is prepared on the micro channel plate through water drawing. And an aluminum film is deposited on the organic film by means of resistance thermal evaporation after optimization. As a result, the complex gate films are achieved within nanometer thickness. Besides, the structure of the complex gate is given characterization through visual means. At last, for the aspect of the function about complex detection ,the feasibility of the gate film complex detector is verified by experiments through a special test system in a vacuum chamber.