Opto-Electronic Advances, 2018, 1 (8): 180014, Published Online: Jan. 10, 2019  

Enhancement of laser ablation via interacting spatial double-pulse effect

Author Affiliations
1 Department of Mechanical and Electrical Engineering, School of Aerospace Engineering, Xiamen University, Xiamen 361102, China
2 Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117576
3 School of Mechatronics Engineering, Harbin Institute of Technology, Harbin 150001, China
4 College of Mechanical and Electrical Engineering, Wenzhou University, Wenzhou, 325035, China
Abstract
A novel spatial double-pulse laser ablation scheme is investigated to enhance the processing quality and efficiency for nanosecond laser ablation of silicon substrate. During the double-pulse laser ablation, two splitted laser beams simultaneously irradiate on silicon surface at a tunable gap. The ablation quality and efficiency are evaluated by both scanning electron microscope and laser scanning confocal microscope. As tuning the gap distance, the ablation can be significantly enhanced if the spatial interaction between the two splitted laser pulses is optimized. The underlying physical mechanism for the interacting spatial double-pulse enhancement effect is attributed to the redistribution of the integrated energy field, corresponding to the temperature field. This new method has great potential applications in laser micromachining of functional devices at higher processing quality and faster speed.

Rui Zhou, Shengdong Lin, Ye Ding, Huan Yang, Kenny Ong Yong Keng, Minghui Hong. Enhancement of laser ablation via interacting spatial double-pulse effect[J]. Opto-Electronic Advances, 2018, 1(8): 180014.

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