光学学报, 2019, 39 (2): 0231001, 网络出版: 2019-05-10
具有超低反射率的折射率渐变封装结构 下载: 1251次
Encapsulation Structure of Gradient Refractive Index with Ultralow Reflectance
薄膜 折射率渐变 超低反射率 封装 二氧化硅 钙钛矿太阳能电池 thin films gradient refractive index ultralow reflectance encapsulation SiO2 perovskite solar cell
摘要
采用电感耦合等离子体增强化学气相沉积(ICP-PECVD)技术,在室温下制备了具有折射率渐变特性的SiO2材料,并对制备工艺与SiO2材料光学特性之间的关联性进行研究。结合椭圆偏振光谱仪拟合得到的结果,对基于折射率渐变SiO2材料膜系封装的钙钛矿电池表面的抗反射特性进行模拟后发现,其抗反射特性优异,在550 nm处反射率可低至0.5%。本研究为兼顾光学特性的低温钙钛矿电池封装提供了一种可参考的技术方案。
Abstract
SiO2 with gradient refractive index is fabricated via inductively-coupled plasma enhanced chemical vapor phase deposition (ICP-PECVD) technology at room temperature, and the relation between fabrication technology and optical characteristics of SiO2 material is studied. The antireflective characteristic of perovskite cells encapsulated by SiO2 with gradient refractive index is simulated by utilizing the results of ellipsometry analysis. It is found that the perovskite cells show an ultra-low reflectance, which reaches 0.5% at 550 nm. This research provides an alternative way to realize low-temperature encapsulation of perovskite cells with considering optical properties.
金国君, 徐恺, 檀珺, 王玲莉, 孟彦龙. 具有超低反射率的折射率渐变封装结构[J]. 光学学报, 2019, 39(2): 0231001. Guojun Jin, Kai Xu, Jun Tan, Lingli Wang, Yanlong Meng. Encapsulation Structure of Gradient Refractive Index with Ultralow Reflectance[J]. Acta Optica Sinica, 2019, 39(2): 0231001.