基于双面集成微结构薄片元件在集成光学成像、光束整形等方面的应用日益普及, 针对其中一些一体化、高深宽比结构在制作方面的难点问题, 本文提出一种无基膜支撑、高深宽比的双面集成微结构元件的制作新方法——紫外压印改进技术。通过该方法, 成功地制作了无基膜、高深宽比结构的集成导光板样品; 样品上下表面微结构形貌与金属模具在误差范围内保持一致, 转印复制过程的物理结构形变小, 且样品的厚度整体均匀、平整无翘曲。实验结果表明, 本文提出的紫外压印改进技术方法能有效地制作无基膜支撑、双面集成高深宽比的微结构元件, 可望在集成光学成像及光束整形、匀光、导光、聚光等光学器件制作领域有良好应用。

Two-sided integrated microstructure elements are increasingly used in the fields of integrated optical imaging and beam shaping. Aimed at resolving the difficulties of fabricating two-sided integrated microstructure elements with integral materials and high aspect ratio structures, a new method was proposed that was an improved ultraviolet imprint technology for fabricating two-sided integrated microstructure elements with high aspect ratios and without a film substrate. By applying this method, integrated light guide plate samples were successfully produced without film substrates and with high aspect ratios. The microstructures on the top and bottom surfaces of the samples were in agreement with the metal modules, within the margin of error, meaning that structural deformation was small in the imprint copying process. Moreover, the integrated light guide plate samples were unbending and of integrally even thickness. The experimental results show that the improved ultraviolet imprint technology can be used to fabricate two-sided integrated microstructure elements with high aspect ratios and without film substrates. This technique is applicable to the fabrication of optical elements with functionalities suitable for integrated optical imaging, beam shaping, light diffusion, light guiding, and light concentration.