光学学报, 2019, 39 (5): 0531001, 网络出版: 2019-05-10
W/SiO2基太阳光谱选择性吸收薄膜的制备和表征 下载: 1154次
Preparation and Characterization of Solar-Selective Absorbers Based on Multilayered W/SiO2 Thin Films
薄膜 太阳光谱选择性吸收 磁控溅射 热辐射 热成像仪 thin films solar spectrum selective absorption magnetron sputtering thermal radiation thermal imager
摘要
采用磁控溅射镀膜仪制备了基于过渡金属W和介质SiO2的6层薄膜样品,膜系结构为Cu (>100.0 nm)/SiO2(63.5 nm)/W(11.0 nm)/SiO2(60.0 nm)/W(5.4 nm)/SiO2(75.5 nm)。在250~2500 nm的波长范围内,该样品的太阳光吸收率为95.3%,且在400 ℃低真空(6 Pa)条件下退火72 h之后,样品的反射光谱特性变化较小,证明了该样品具有极高的热稳定性。使用红外热成像仪对样品的红外辐射特性进行了在位实时表征,结果表明样品具有低辐射特性。这些优良的特性有利于该样品在太阳能光热转换中的应用。
Abstract
A six-layer thin-film sample constructed from the transition metal W and dielectric material SiO2 is prepared through the magnetron sputtering apparatus. The microstructure of the film is Cu(>100.0 nm)/SiO2(63.5 nm)/W(11.0 nm)/SiO2(60.0 nm))/W(5.4 nm)/SiO2(75.5 nm). The fabricated sample has a solar absorptance of 95.3% in the wavelength range of 250-2500 nm. Under the low vacuum (6 Pa) condition, the reflectance characteristics of the sample after annealing at 400 ℃ for 72 h show no obvious change, which proves that the sample has an excellent thermal stability. In addition, an infrared thermal imager is adopted for the real-time and in-situ characterization of the infrared radiation from the sample and it is proved that the sample has a low radiation characteristic. These unique properties imply that the sample is highly suited for its application in solar thermal conversion.
郭帅, 吴莹, 古同, 胡二涛. W/SiO2基太阳光谱选择性吸收薄膜的制备和表征[J]. 光学学报, 2019, 39(5): 0531001. Shuai Guo, Ying Wu, Tong Gu, Ertao Hu. Preparation and Characterization of Solar-Selective Absorbers Based on Multilayered W/SiO2 Thin Films[J]. Acta Optica Sinica, 2019, 39(5): 0531001.