采用步进投影式光刻机的步进原理控制曝光剂量, 制备楔形模斑转换器.分析了不同曝光剂量对侧壁形貌的影响以及最佳的刻蚀参数.实验结果表明: 最佳曝光时间为20 ms/次, 回流温度为160℃, 时间为1 min, 当刻蚀气体及比例为SF6∶He=8∶80时, 刻蚀后得到满足需求的样品,且制备方式制作周期短, 精度高, 与电子束灰度曝光方法相比, 具有高效率、低成本等优点.

The stepwise principle of the step projection lithography machine is used to control the exposure dose to prepare a wedge-shaped mode size converter.The effects of different exposure doses on the sidewall morphology and the best etching parameters were analyzed. The experimental results show that the optimum exposure time is 20 ms each time, the reflow temperature is 160 ℃ for 1 min. When the etching gas and the ratio are SF6∶He=8∶80, the sample obtained after etching has good morphology. The preparation method has the advantages of short manufacturing cycle and high precision, and has the advantages of high efficiency and low cost compared with the electron beam gray exposure method.