扫描干涉光刻机移相锁定是实现大面积高精度全息光栅曝光拼接的关键之一。为了实现大面积高精度全息光栅高精度曝光拼接, 针对扫描干涉光刻机步进扫描拼接轨迹, 重点开展了移相锁定系统的研究。在零差移频式相位锁定分系统和外差利特罗式光栅位移测量干涉仪的基础上, 阐述了扫描干涉光刻机的新型移相锁定系统原理。针对新型的移相锁定系统原理, 构建了移相锁定控制系统实验装置。最后, 基于移相锁定控制实验装置, 针对移相锁定定位性能, 开展了移相锁定定位控制实验以及影响控制精度的因素分析, 实现了±3.27 nm (3σ, Λ=251 nm)的定位控制精度; 针对移相跟踪控制性能, 在移相跟踪控制精度实验分析的基础上, 利用陷阱滤波&PID控制实现了±4.17 nm(3σ, Λ=251 nm)的跟踪控制精度。

Phase-shifting locking is one of the key aspects of Scanning Beam Interference Lithography (SBIL) in achieving highly accurate exposure stitching of a large grating. To achieve this objective, a phase-shifting locking system was investigated for the stepping/scanning exposure trajectory of SBIL. Firstly, based on a previously proposed homodyne frequency-shifting interference pattern locking system and a heterodyne Littrow grating interferometer, a novel phase-shifting locking system scheme was proposed for SBIL. An experimental setup was then designed for this proposed scheme. Based on the setup, experimental and factor analyses were conducted to facilitate precise phase-shifting positioning control and an accuracy of ±3.27 nm (3σ, Λ=251 nm) was achieved. In addition, an accuracy of ±4.17 nm (3σ, Λ=251 nm) was achieved for phase-shifting locking control using a notch and PID control.