利用电沉积法制备磁屏蔽薄膜，不仅可以精确控制沉积膜的化学成分和厚度，而且可以在复杂几何形状的表面上形成薄膜。通过电沉积装置制备了铁镍-铜-铁镍多层复合磁屏蔽薄膜，并探究了磁场强度、厚度、高温环境对磁屏蔽薄膜屏蔽效能的影响。实验结果表明，50 μm和100 μm样品的屏蔽效能随磁场强度的增大而增大，200 μm的屏蔽效能则是先增大后降低；在4~16 Oe磁场中，厚度越大，薄膜屏蔽效果越好；100 ℃的温度会降低所有厚度的磁屏蔽薄膜的屏蔽效能。

The preparation of magnetic shielding films by electrodeposition cannot only precisely control the chemical composition and thickness of the films, but also form films on the surface of complex geometry. In this paper, iron-nickel-copper-iron-nickel multilayer composite magnetic shielding films were prepared by electrodeposition device, and the effects of magnetic field intensity, thickness and high temperature treatment on the shielding effectiveness of magnetic shielding films were investigated. The experimental results show that the shielding effectiveness of 50 μm and 100 μm samples increases with the increase of magnetic field intensity, while that of 200 μm samples increases first and then decreases; in the 4-16 Oe magnetic field, the bigger the thickness, the better the shielding effect of the film; the shielding effectiveness of all thickness of the magnetic shielding film will be reduced under 100 ℃.