中国激光, 2019, 46 (12): 1202009, 网络出版: 2019-12-02
抛光过程中光学元件表面划痕的形成和控制 下载: 1401次
Formation and Control of Scratches on Surfaces of Optical Components During Polishing
光学制造 抛光 石英玻璃 划痕 模型 表面粗糙度 optical fabrication polishing fused-silica glass scratch model surface roughness
摘要
通过在石英玻璃的抛光过程中引入α-Al2O3颗粒,对抛光过程中石英工件表面产生的划痕类型和收尾阶段不同粒径杂质颗粒产生的划痕长度进行分析,同时研究了抛光液质量分数和抛光盘结构对石英玻璃抛光质量的影响。结果表明:杂质颗粒需要盘面提供足够大的支撑力才能在工件表面产生划痕,而杂质颗粒所受盘面的支撑力大小取决于其位置高度和共同参与受力的基质颗粒数量;杂质颗粒的位置高度很难掌控,但在相同工艺条件下,使用质量分数为6%的抛光粉和具有多微孔结构的沥青抛光盘可以有效降低划痕的产生概率,并且不会导致抛光表面粗糙度变差或过度影响抛光效率,对实际加工生产有指导意义。
Abstract
The types of surface scratches on the fused-silica workpiece during the polishing process and the length of the scratches caused by impurity particles having different particle sizes in the ending stage are analyzed by introducing α-AL2O3 particles into the polishing process of fused-silica glass. Further, the effects of the polishing-powder mass fraction in the polishing solution and the polishing pad structure on the polishing quality of the fused-silica glass are studied. Results show that the impurity particles require sufficient support force provided by the polishing pad to produce scratches on the surface of the workpiece; the support force of the polishing pad on which the impurity particles are subjected depends on their positional height and the number of matrix particles participating in the polishing process. It is difficult to control the positional height of the impurity particles; however, at a relatively high polishing-powder mass fraction of 6%, the microporous pitch-polishing pad effectively reduces the scratching probability without introducing surface roughness or excessively affecting the polishing efficiency under identical process conditions. These observations exhibit guiding significance for processing and production.
汤文龙, 梁尚娟, 焦翔, 樊全堂, 尹进, 朱健强. 抛光过程中光学元件表面划痕的形成和控制[J]. 中国激光, 2019, 46(12): 1202009. Wenlong Tang, Shangjuan Liang, Xiang Jiao, Quantang Fan, Jin Yin, Jianqiang Zhu. Formation and Control of Scratches on Surfaces of Optical Components During Polishing[J]. Chinese Journal of Lasers, 2019, 46(12): 1202009.