Design and fabrication of a SiN-Si dual-layer optical phased array chip

Pengfei Wang; Guangzhen Luo; Yang Xu; Yajie Li; Yanmei Su; Jianbin Ma; Ruiting Wang; Zhengxia Yang; Xuliang Zhou; Yejin Zhang; Jiaoqing Pan

doi:doi:10.1364/PRJ.387376

Photonics Research, 2020, 8 (6): 06000912, Published Online: May. 19, 2020

Design and fabrication of a SiN-Si dual-layer optical phased array chip Download： 1141次

Pengfei Wang ^1,2Guangzhen Luo ^1,2Yang Xu ³Yajie Li ^1,2Yanmei Su ^1,2Jianbin Ma ^1,2Ruiting Wang ^1,2Zhengxia Yang ^1,2Xuliang Zhou ^1,2Yejin Zhang ^1,2Jiaoqing Pan ^1,2,*

Author Affiliations

¹ Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China

² Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

³ Beijing R&D Institute, VanJee Technology, Beijing 100193, China

Abstract

A SiN-Si dual-layer optical phased array (OPA) chip is designed and fabricated. It combines the low loss of SiN with the excellent modulation performance of Si, which improves the performance of Si single-layer OPA. A novel optical antenna and an improved phase modulation method are also proposed, and a two-dimensional scanning range of

96 ° \times 14 °

is achieved, which makes the OPA chip more practical.

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Pengfei Wang, Guangzhen Luo, Yang Xu, Yajie Li, Yanmei Su, Jianbin Ma, Ruiting Wang, Zhengxia Yang, Xuliang Zhou, Yejin Zhang, Jiaoqing Pan. Design and fabrication of a SiN-Si dual-layer optical phased array chip[J]. Photonics Research, 2020, 8(6): 06000912.

Design and fabrication of a SiN-Si dual-layer optical phased array chip Download： 1141次

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