中国激光, 2020, 47 (8): 0805003, 网络出版: 2020-08-17   

基于遗传算法的微反射镜阵列角位置分布算法 下载: 901次

Angular Position Distribution Algorithm of Micro Mirror Array Based on Genetic Algorithm
作者单位
1 中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800
2 中国科学院大学, 北京 100049
摘要
自由光瞳照明技术是28 nm及以下节点浸没光刻机中一种重要的光刻分辨率增强技术,其通过微反射镜阵列(MMA)调整光束的角谱来实现任意照明模式, MMA角位置分布对自由光瞳照明技术的应用具有重要的意义。提出了基于遗传算法的MMA角位置分布算法,该算法相比基于模拟退火算法的MMA角位置分布算法,迭代速度提高了10倍以上,并且该算法得到的MMA角位置分布可精确复现目标光瞳强度分布。光刻性能仿真结果表明,对于数千种光刻胶曝光图形,算法光瞳和目标光瞳的光刻胶曝光图形不对称性分布的方均根(RMS)值基本一致,关键尺寸差异分布RMS值均小于0.5 nm。
Abstract
Freeform pupil illumination technology is an important photolithographic resolution enhancement technology for immersion photolithography machines locating in nodes at 28 nm and below. Arbitrary illumination mode could be realized by adjusting the angular spectrum of the beam by micro mirror array (MMA). The angular position distribution of MMA is of great significance to the application of the freeform pupil illumination technology. An angular position distribution algorithm of MMA based on genetic algorithm is proposed in this paper. Compared with the angular position distribution algorithm of MMA based on the simulated annealing algorithm, the iteration speed of the proposed algorithm is increased by more than 10 times, and the MMA angular position distribution obtained by the proposed algorithm can accurately reproduce the distribution of the target pupil intensity. Results of the photolithography performance simulation show that the root mean square (RMS) values of the asymmetry distribution of the photoresist exposure patterns of the algorithm pupil and the target pupil are basically the same, and the RMS values of critical dimension difference distribution are less than 0.5 nm.

曾宗顺, 张方, 牛志元, 马晓喆, 朱思羽, 黄惠杰. 基于遗传算法的微反射镜阵列角位置分布算法[J]. 中国激光, 2020, 47(8): 0805003. Zeng Zongshun, Zhang Fang, Niu Zhiyuan, Ma Xiaozhe, Zhu Siyu, Huang Huijie. Angular Position Distribution Algorithm of Micro Mirror Array Based on Genetic Algorithm[J]. Chinese Journal of Lasers, 2020, 47(8): 0805003.

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