光学学报, 2019, 39 (9): 0905001, 网络出版: 2019-09-09
基于超精密激光直写系统制作二维光栅 下载: 1981次封面文章
Two-Dimensional Grating Fabrication Based on Ultra-Precision Laser Direct Writing System
摘要
二维光栅是光刻机光栅尺系统的核心元件。搭建了超精密激光直写系统,基于二维超精密工件台,通过旋转基片90°进行两次曝光,制作出栅线密度为1200 line/mm的二维光栅掩模。原子力显微镜和扫描电镜结果表明,所制作的掩模轮廓清晰,空间分布均匀。实验结果证明了超精密激光直写系统能够制作出二维光栅掩模,在制作大尺寸、高精度二维计量光栅方面有着广阔的应用前景。
Abstract
Two-dimensional (2D) gratings are the key elements of optical encoders in lithography machines. Herein, an ultra-precision laser direct writing system is proposed. Based on the ultra-precision platform, we obtain a 2D grating mask with grid line density of 1200 line/mm after double exposure by rotating the substrate by 90°. The atomic force microscopy and scanning electron microscopy images indicate that the profile of the 2D grating mask is clear and its spatial uniformity is excellent. These results demonstrate that the proposed ultra-precision laser direct writing system effectively fabricates a 2D grating mask, showing promise in the fabrication of large, high-precision 2D metrological gratings.
李民康, 向显嵩, 周常河, 韦春龙, 贾伟, 项长铖, 鲁云开, 朱世曜. 基于超精密激光直写系统制作二维光栅[J]. 光学学报, 2019, 39(9): 0905001. Minkang Li, Xiansong Xiang, Changhe Zhou, Chunlong Wei, Wei Jia, Changcheng Xiang, Yunkai Lu, Shiyao Zhu. Two-Dimensional Grating Fabrication Based on Ultra-Precision Laser Direct Writing System[J]. Acta Optica Sinica, 2019, 39(9): 0905001.