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基于超精密激光直写系统制作二维光栅

Two-Dimensional Grating Fabrication Based on Ultra-Precision Laser Direct Writing System

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摘要

二维光栅是光刻机光栅尺系统的核心元件。搭建了超精密激光直写系统,基于二维超精密工件台,通过旋转基片90°进行两次曝光,制作出栅线密度为1200 line/mm的二维光栅掩模。原子力显微镜和扫描电镜结果表明,所制作的掩模轮廓清晰,空间分布均匀。实验结果证明了超精密激光直写系统能够制作出二维光栅掩模,在制作大尺寸、高精度二维计量光栅方面有着广阔的应用前景。

Abstract

Two-dimensional (2D) gratings are the key elements of optical encoders in lithography machines. Herein, an ultra-precision laser direct writing system is proposed. Based on the ultra-precision platform, we obtain a 2D grating mask with grid line density of 1200 line/mm after double exposure by rotating the substrate by 90°. The atomic force microscopy and scanning electron microscopy images indicate that the profile of the 2D grating mask is clear and its spatial uniformity is excellent. These results demonstrate that the proposed ultra-precision laser direct writing system effectively fabricates a 2D grating mask, showing promise in the fabrication of large, high-precision 2D metrological gratings.

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DOI:10.3788/AOS201939.0905001

所属栏目:衍射与光栅

基金项目:中国科学院前沿科学重点研究项目;

收稿日期:2019-04-16

修改稿日期:2019-05-20

网络出版日期:2019-09-01

作者单位    点击查看

李民康:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800中国科学院大学材料与光电研究中心, 北京 100049
向显嵩:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800中国科学院大学材料与光电研究中心, 北京 100049
周常河:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800中国科学院大学材料与光电研究中心, 北京 100049
韦春龙:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800
贾伟:暨南大学光子技术研究院, 广东 广州 511443
项长铖:暨南大学光子技术研究院, 广东 广州 511443
鲁云开:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800中国科学院大学材料与光电研究中心, 北京 100049
朱世曜:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800中国科学院大学材料与光电研究中心, 北京 100049

联系人作者:周常河(chazhou@mail.shcnc.ac.cn)

备注:中国科学院前沿科学重点研究项目;

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引用该论文

Li Minkang,Xiang Xiansong,Zhou Changhe,Wei Chunlong,Jia Wei,Xiang Changcheng,Lu Yunkai,Zhu Shiyao. Two-Dimensional Grating Fabrication Based on Ultra-Precision Laser Direct Writing System[J]. Acta Optica Sinica, 2019, 39(9): 0905001

李民康,向显嵩,周常河,韦春龙,贾伟,项长铖,鲁云开,朱世曜. 基于超精密激光直写系统制作二维光栅[J]. 光学学报, 2019, 39(9): 0905001

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