在基因测序系统中,能量集中度是实现碱基准确识别的一个重要参数。拍照过程中,硅片台的位置误差会使硅片和相机之间产生偏移并导致图像退化,进一步影响能量集中度。建立了硅片台动态性能参数与能量集中度之间的理论模型。基于基因测序系统进行静态和动态实验,结果显示:能量集中度与硅片台的位置标准差呈线性关系。如果要求能量集中度优于65%,硅片台的位置标准偏差应控制在140 nm以内。同时,基于动态实验采集的DNA纳米球图像计算出的能量集中度与实验结论相符。该研究可以合理地分配基因测序系统中硅片台的动态性能指标。

In a gene sequencing system, the ensquared energy is an important parameter for realizing accurate recognition for the base. Nevertheless, the displacement between wafer and camera, which is caused by vibration and position error of wafer stage while photographing, will decrease the image quality and further influence the ensquared energy. This study establishes the relationship model between the dynamic factors and ensquared energy. Static and dynamic experiments are carried out on the sequencing platform. The results reveal that the ensquared energy has linear relationship with the location standard deviation of the wafer stage. If the ensquared energy value is required larger than 65%, the location standard deviation should be controlled below 140 nm. Meanwhile, the ensquared energy calculated by using the DNA nanoball image collected in the dynamic experiment is in accordance with the experimental conclusion. The dynamic performance parameters of the wafer stage in the gene sequencing system can be allocated reasonably.