光学学报, 2005, 25 (10): 1433, 网络出版: 2006-05-23
X射线W/B4C宽带多层膜的优化设计和制备
Optimized Design and Fabrication of X-Ray W/B4C Broadband Multilayer Film
X射线光学 宽带多层膜 评价函数 遗传算法 磁控溅射 X-ray optics broadband multilayer merit function genetic algorithms magnetron sputtering
摘要
介绍了X射线宽带多层膜材料W和B4C的选定方法,依据伯宁(BERNING)公式确定出了在0.154 nm处X射线宽带多层膜的最佳膜对数。引入适当的评价函数,利用具有全局寻优特性且效率较高的遗传算法,在波长0.154 nm处优化设计出了掠入射角(θ)0.5°~0.9°范围内反射率值达到40%的宽角度宽带多层膜。宽带多层膜反射镜采用磁控溅射方法制备,并用X射线衍射仪对样品进行了检测,结果表明在掠入射角(2θ)1.0°~1.8°之间的相对反射率光谱曲线比较平坦。
Abstract
A method of selecting and confirming materials with W and B4C for X-ray broadband multilayer film is presented. The minimum bilayers number of X-ray broadband multilayer film has been confirmed by using BERNING formula at the wavelength 0.154 nm. After introducing the suitable merit function, a broad angular broadband W/B4C multilayer film has been designed successfully by using genetic algorithm. The flat reflectance of broadband multilayer film is 40% in the wavelength 0.154 nm at the grazing incidence angel (θ) of 0.5°~0.9°. The multilayer film has been fabricated on the magnetron sputtering system. A flat relative reflectance spectrum curve has been measured at the grazing incidence angle (2θ) of 1.0°~1.8° by X-ray diffractometer.
姚志华, 金春水, 杨雄, 张立超, 金伟华, 曹健林. X射线W/B4C宽带多层膜的优化设计和制备[J]. 光学学报, 2005, 25(10): 1433. 姚志华, 金春水, 杨雄, 张立超, 金伟华, 曹健林. Optimized Design and Fabrication of X-Ray W/B4C Broadband Multilayer Film[J]. Acta Optica Sinica, 2005, 25(10): 1433.