中国激光, 2016, 43 (10): 1003002, 网络出版: 2016-10-12   

退火对金属介质多层膜的界面扩散及抗化学清洗性能的影响

Influence of Annealing on Interface Diffusion and Anti-Chemica-Cleaning Property of Metal-Dielectric Multilayer Films
作者单位
1 中国科学院大学, 北京 100049
2 中国科学院上海光学精密机械研究所强激光材料重点实验室, 上海 201800
3 中国科学技术大学近代物理系核探测与核电子学国家重点实验室, 合肥 230026
摘要
对金属介质多层膜样品进行不同温度的退火处理。实验发现,当退火温度为350 ℃时,在样品Au层与SiO2层的界面处出现过渡层,样品具有很强的抗化学清洗能力。利用透射电子显微镜观测与能谱仪分析发现,过渡层的出现主要是Cr原子从Au层底部扩散到SiO2层的结果。过渡层可以增强Au层与SiO2层间的粘附力,阻挡酸溶液的渗入,使得金属介质多层膜的抗化学清洗能力得到增强。
Abstract
Samples of metal-dielectric multilayer films are post-annealed at different temperatures. It is experimentally found that at the annealing temperature of 350 ℃, a transition layer between Au layer and SiO2 layer of the samples occurs, and these samples possess the strong anti-chemical-cleaning ability. Based on the investigation by a transmission electron microscope and the analysis by an energy dispersive spectrometer, it is found that the occurrence of transition layers is mainly the result of Cr atoms diffusing from the Au bottom layer to the SiO2 layer. The transition layer can enhance the adhesion between the Au layer and SiO2 layer and block the infiltration of acid solutions, thus the anti-chemical-cleaning ability of metal-dielectric multilayer films is enhanced.
参考文献

[1] 钱国林, 吴建宏, 李朝明, 等.有像差情况下的全息光栅拼接研究[J]. 光学学报, 2015, 35(3): 0305002.

    Qian Guolin, Wu Jianhong, Li Chaoming, et al. Study of gratings tiled by holographic exposure with wave aberration[J].Acta Optica Sinica. 2015, 35(3): 0305002.

[2] Kessler T J, Bunkenburg J, Huang H, et al. Demonstration of coherent addition of multiple gratings for high-energy chirped-pulse-amplified lasers[J]. Opt Lett, 2004, 29(6): 635-637.

[3] Qiao J, Kalb A, Guardlben M J, et al. Large-aperture grating tiling by interferometry for petawatt chirped-pulse-amplification systems[J]. Opt Express, 2007, 15(15): 9562-9574.

[4] Guan H Y, Chen S B, Wu J B, et al. High-efficiency, broad-bandwidth metal/multilayer-dielectric gratings[J]. Opt Lett, 2014, 39(1): 170-173.

[5] Guan H Y, Jin Y X, Liu S J, et al. Near-field optical properties of wide bandwidth metal multi-layer dielectric gratings for pulse compressor[J]. Appl Phys B, 2014, 114(4): 557-565.

[6] Bonod J, Néauport J. Optical performance and laser induced damage threshold improvement of diffraction gratings used as compressors in ultra high intensity lasers[J]. Opt Commun, 2003, 260(2): 649-655.

[7] Palmier S, Neauport J, Baclet N, et al. High reflection mirrors for pulse compression gratings[J]. Opt Express, 2009, 17(22): 20430-20439.

[8] 王琦, 郑衍畅, 邱克强, 等. 90° 顶角中阶梯光栅的研制[J]. 光学学报, 2014, 34(9): 0905001.

    Wang Qi, Zheng Yanchang, Qiu Keqiang, et al. Fabrication of echelle gratings with 90° apex angle[J]. Acta Optica Sinica, 2014, 34(9): 0905001.

[9] Jovanovic I B, Brown C G, Stuart B C, et al. Precision damage tests of multilayer dielectric gratings for high-energy petawatt lasers[C]. SPIE, 2005, 5647: 34-42.

[10] Kong W J, Liu S J, Shen J, et al. Study on LIDT of MDGs for different fabrication processes[J]. Microelectron Eng, 2006, 83(4): 1426-1429.

[11] Howard H P, Aiello A F, Dressler J G, et al. Improving the performance of high-laser-damage-threshold, multilayer dielectric pulse-compression gratings through low-temperature chemical cleaning[J]. Appl Optics, 2013, 52(8): 1682-1692.

[12] Chen S B, Sheng B, Xu X D, et al. Wet-cleaning of contaminants on the surface of multilayer dielectric pulse compressor gratings by the Piranha solution[C]. SPIE, 2010, 7655: 765522.

[13] Liddell H, Mehrotra K, Lambropoulos J, et al. Fracture mechanics of delamination defects in multilayer dielectric coatings[J]. Appl Optics, 2013, 52(32): 7689-7698.

[14] 王兆阳, 王宏伟, 徐世峰. 退火对PLD方法制备的ZnO薄膜紫外发光特性的影响[J]. 光学学报, 2014, 34(s2): s231002.

    Wang Zhaoyang, Wang Hongwei, Xu Shifeng. Effect of annealing on ultraviolet emission characteristics of ZnO films by PLD[J]. Acta Optica Sinica, 2014, 34(s2): s231002.

[15] Yang C, Fan H Q, Qiu S J, et al. Microstructure and dielectric properties of La2O3 films prepared by ion beam assistant electron-beam evaporation[J]. J Non-Cryst Solids, 2009, 355(1): 33-37.

[16] Yang C, Fan H Q, Xi Y X, et al. Effects of depositing temperatures on structure and optical properties of TiO2 film deposited by ion beam assisted electron beam evaporation[J]. Appl Surf Sci, 2008, 254(9): 2685-2689.

[17] 吴建波, 晋云霞, 关贺元, 等. 退火温度对宽带脉冲压缩光栅载体金属/介质多层高反膜的影响[J]. 无机材料学报, 2014, 29(10): 1087-1092.

    Wu Jianbo, Jin Yunxia, Guan Heyuan, et al. Effect of annealing temperature on metal/dielectric multilayers for fabricating broadband pulse compression gratings[J]. Journal of Inorganic Materials, 2014, 29(10): 1087-1092.

[18] Li Q, Ye B N, Hao Y P, et al. Annealing temperature effects on the magnetic properties and induced defects in C/N/O implanted MgO[J]. Nucl Instrum Meth B, 2013(297): 29-34.

[19] Krause Rehberg R, Leipner H S. Positron annihilation in semiconductors: Defect studies[M]. Berlin: Springer Science & Business Media, 1999, 127.

[20] Toivonen J, Hakkarainen T, Sopanen M, et al. Observation of defect complexes containing Ga vacancies in GaAsN[J]. Appl Phys Lett, 2003, 82(1): 40-42.

[21] Gebauer J, Brner F, Krause R R, et al. Defect identification in GaAs grown at low temperatures by positron annihilation[J]. J Appl Phys, 2000, 87(12): 8368-8379.

[22] Chen Z Q, Sekiguchi T, Yuan X L, et al. N+ ion-implantation-induced defects in ZnO studied with a slow positron beam[J]. Journal of Physics: Condensed Matter, 2004, 16(2): S293.

[23] Galeener F, Lucovsky G. Longitudinal optical vibrations in glasses: GeO2 and SiO2[J]. Phys Rev Lett, 1976, 37(22): 1474.

[24] Giacomazzi L, Umari P, Pasquarello A. Medium-range structure of vitreous SiO2 obtained through first-principles investigation of vibrational spectra[J]. Phys Rev B, 2009, 79(6): 064202.

张洪, 晋云霞, 孔钒宇, 黄昊鹏, 崔云, 胡国行, 李响潭, 葛雯娜, 叶邦角. 退火对金属介质多层膜的界面扩散及抗化学清洗性能的影响[J]. 中国激光, 2016, 43(10): 1003002. Zhang Hong, Jin Yunxia, Kong Fanyu, Huang Haopeng, Cui Yun, Hu Guoxing, Li Xiangtan, Ge Wenna, Ye Bangjiao. Influence of Annealing on Interface Diffusion and Anti-Chemica-Cleaning Property of Metal-Dielectric Multilayer Films[J]. Chinese Journal of Lasers, 2016, 43(10): 1003002.

本文已被 2 篇论文引用
被引统计数据来源于中国光学期刊网
引用该论文: TXT   |   EndNote

相关论文

加载中...

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!