Chinese Optics Letters, 2019, 17 (9): 093102, Published Online: Jul. 29, 2019   

Te-free SbBi thin film as a laser heat-mode photoresist Download: 842次

Author Affiliations
1 Laboratory of Micro-Nano Optoelectronic Materials and Devices, Key Laboratory of Materials for High-Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
2 Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
3 KBTEM-OMO Joint Stock Company, Minsk 220033, Republic of Belarus
Abstract
A Te-free binary phase change material SbBi is proposed as a new inorganic photoresist for heat-mode lithography. It shows good film-forming ability (surface roughness <1 nm), low threshold power for crystallization (2 mW), and high etching selectivity (15:1). Line-type, dot-type, and complex pattern structures with the smallest feature size of 275 nm are fabricated on SbBi thin films using a 405 nm diode laser direct writing system. In addition, the excellent grating structures with a period of 0.8 μm demonstrate that thermal interference does not affect the adjacent microstructures obviously. These results indicate that SbBi is a promising laser heat-mode resist material for micro/nanostructure fabrication.

Kui Zhang, Zhengwei Wang, Guodong Chen, Yang Wang, Aijun Zeng, Jing Zhu, Syarhei Avakaw, Heorgi Tsikhanchuk. Te-free SbBi thin film as a laser heat-mode photoresist[J]. Chinese Optics Letters, 2019, 17(9): 093102.

本文已被 1 篇论文引用
被引统计数据来源于中国光学期刊网
引用该论文: TXT   |   EndNote

相关论文

加载中...

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!