Chinese Optics Letters, 2021, 19 (7): 072201, Published Online: Mar. 22, 2021  

Self-aligned fiber-based dual-beam source for STED nanolithography Download: 801次

Author Affiliations
School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 201800, China
Abstract
A fiber-based source that can be exploited in a stimulated emission depletion (STED) inspired nanolithography setup is presented. Such a source maintains the excitation beam pulse, generates a ring-shaped depletion beam, and automatically realizes dual-beam coaxial alignment that is critical for two beam nanolithography. The mode conversion of the depletion beam is realized by using a customized vortex fiber, which converts the Gaussian beam into a donut-shaped azimuthally polarized beam. The pulse width and repetition frequency of the excitation beam remain unchanged, and its polarization states can be controlled. According to the simulated point spread function of each beam in the focal region, the full width at half-maximum of the effective spot size in STED nanofabrication could decrease to less than 28.6 nm.

Jian Chen, Guoliang Chen, Qiwen Zhan. Self-aligned fiber-based dual-beam source for STED nanolithography[J]. Chinese Optics Letters, 2021, 19(7): 072201.

引用该论文: TXT   |   EndNote

相关论文

加载中...

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!