基于角谱衍射理论，对扫描积分塔尔博特光刻术进行了理论分析与数值模拟。研究了扫描距离、扫描起始位置、扫描速度非匀速以及照明光源不同特性对扫描积分塔尔博特光刻所得光栅条纹质量的影响。模拟结果表明，当扫描距离为塔尔博特周期的整数倍时，扫描起始位置、扫描速度的非匀速性对扫描积分塔尔博特光刻的成像质量影响较小；当入射光源存在一定谱宽或发散角不大于0.05°时，扫描积分塔尔博特光刻仍可得到对比度较一致的倍频光栅条纹，证实了扫描积分塔尔博特光刻具有良好的工艺适用性。扫描积分塔尔博特光刻不需要昂贵而复杂的投影光学系统，可克服塔尔博特自成像有限焦深问题，对掩模与基片的定位精度及涂胶基片的平整度容忍度较高。该方法具有在非平面基底上制备大面积、低成本、高精度周期微纳结构的应用前景。

Both theoretical analysis and numerical simulation for displacement Talbot lithography are conducted based on angular spectrum diffraction. The factors which influence the grating fringe quality obtained by displacement Talbot lithography such as displacement distance, starting position, non-uniform displacement velocity and different characteristics of lighting source are also discussed in detail. Simulation results show that, when the displacement distance is integer multiples of Talbot period, the factors of initial position and non-uniform displacement velocity have little influence on imaging quality of displacement Talbot lithography. When there is a certain spectral width of the incident light source or the divergence angle is not larger than 0.05°, the displacement Talbot lithography can still obtain double frequency grating fringes whose contrast is more consistent, which verifies that the displacement Talbot lithography possesses an outstanding process applicability. Displacement Talbot lithography does not require expensive and complicated projection optical system, and can overcome the problem of limited depth of focus for Talbot self-imaging. Meanwhile, displacement Talbot lithography has higher tolerance for the positioning accuracy between mask and substrate as well as the substrate planeness. The method has promising potential to be applied in non-planar substrate for the manufacture of periodical micro structures with wide area, low expense and high precision.