比较了基于光激发-光抑制(SPIN)和受激辐射损耗(STED)的两种双光束超分辨数据写入技术的机理,为基于STED的超分辨数据写入技术建立了动态物理模型,研究其光致聚合过程中的工作机制,并模拟了基于SPIN和STED的双光束超分辨数据写入技术在记录点尺寸和分辨率方面的差异。结果表明:基于STED的双光束超分辨数据写入技术具有无需抑制剂、原理简单的优势,但其需要第二束辅助光的强度较大且对聚合作用的抑制效率低,在多点写入情况下点的尺寸变大,记录均匀性变差。基于SPIN的双光束超分辨数据写入技术所需能量小,多点记录时引发剂分子消耗将抵消抑制剂分子消耗带来的影响,整体均匀性和稳定性好。因此基于SPIN的双光束超分辨数据写入技术在超高密度存储领域应用前景更好。

Two mechanisms of realizing dual-beam super-resolution optical recording are compared in this paper. One is super-resolution photoinduction-inhibited nanolithography (SPIN), and the other is stimulated emission depletion (STED). We establish a dynamic physical model of STED-based dual-beam super-resolution optical recording technology and study its mechanism in the photo-polymerization process. The differences in dot size and resolution between SPIN-based and STED-based dual-beam super-resolution optical recording technologies are simulated. The results show that the STED-based dual-beam super-resolution optical recording technology has the advantages of no inhibitor and simple principle, however, it needs higher dual-beam intensity and has lower inhibition efficiency of polymerization. In addition, the recording uniformity becomes more unsatisfactory and the dot size increases in the multi-point recording scenario. On the contrary, the SPIN-based dual-beam super-resolution optical recording technology requires much lower dual-beam intensity, and the initiator molecule consumption will cancel out the effect of the inhibitor molecule consumption, leading to great uniformity and stability under multi-point recording. Therefore, the SPIN-based dual-beam super-resolution optical recording technology has better prospect in the field of ultra-high density optical data storage.