在不同氪(Kr)离子束参数下,研究了微波回旋共振离子源对旋转蓝宝石样片表面的刻蚀效果。采用四因素三水平正交实验,分析了Kr ⁺离子束的入射角度、离子束能量、束流密度、作用时间对辐照后蓝宝石表面结构的影响规律,研究了离子束参数与蓝宝石表面粗糙度、刻蚀速率的关系。实验结果表明:当离子束入射角度为60°、能量为600 eV、束流密度为239 μA·cm ^-2、作用时间为90 min时,样品表面的粗糙度最大,且形成的表面形貌具有明显的点状结构;在同样的离子束入射角度、能量和束流密度下,作用时间为30 min时,刻蚀速率最大,表面形貌点状结构密集。利用最优参数组合可得到良好的点状纳米结构、最优的粗糙度和刻蚀速率。

We used a microwave gyro resonance ion source to study the etching effects on the surfaces of rotating sapphire samples under different Kr +-ion beam parameters. We used the four-factor and three-level orthogonal experiments to analyze the influences of the incident angle, energy, ion flux density, and action time of a Kr +-ion beam on the sapphire surface structures after irradiation. We also studied the relationship between ion beam parameters and sapphire surface roughness and etching rates. The experimental results demonstrate that when an ion beam has an incident angle of 60°, an energy of 600 eV, an ion flux density of 239 μA·cm -2, and action time of 90 min, the sample surface roughness after etching is the greatest and the dot-like structures are formed on the sample surface. In contrast, under the same incident angle, energy, and ion flux density of the ion beam, but a shorter etching time of 30 min, the etching rate reaches its maximum value and the dot-like structures on the surface are dense. Therefore, one can obtain good dot-like nanostructures, optimal roughness and etching rate using the optimal combination of parameters.