角分辨光电子能谱光束线1200 line/mm光栅研制
徐向东, 刘正坤, 邱克强, 刘颖, 洪义麟, 付绍军. 角分辨光电子能谱光束线1200 line/mm光栅研制[J]. 光学学报, 2011, 31(10): 1005008.
Xu Xiangdong, Liu Zhengkun, Qiu Keqiang, Liu Ying, Hong Yilin, Fu Shaojun. Fabrication of 1200 line/mm Laminar Grating for ARPES[J]. Acta Optica Sinica, 2011, 31(10): 1005008.
[1] 马德伟, 乔山, 张新夷 等. 上海光源真空紫外角分辨光电子能谱束线设计[J]. 光学精密工程, 2007, 15(12): 1844~1849
[2] 徐向东, 洪义麟, 霍同林 等. 同步辐射Laminar光栅的研制[J]. 光学技术, 2001, 27(5): 459~461
Xu Xiangdong, Hong Yilin, Huo Tonglin et al.. Fabrication of laminar grating for synchrotron radiation[J]. Optical Technique, 2001, 27(5): 459~461
[3] 徐向东. 全息离子束刻蚀真空紫外及软X射线衍射光栅研究[D]. 合肥: 中国科学技术大学, 2001. 96~114
Xu Xiangdong. Fabrication of VUV and Soft X-Ray Diffraction Gratings by Holographic Ion Beam Etching Technique[D]. Hefei: University of Science and Technology of China, 2001. 96~114
[4] 樊叔维, 周庆华, 李红. 槽型衍射光栅结构参数优化设计研究[J]. 光学学报, 2010, 30(11): 3133~3139
[5] 刘全, 吴建宏, 杨卫鹏 等. 线性啁啾相位掩模的研制[J]. 中国激光, 2009, 36(3): 677~682
[6] 洪义麟, 刘良保, 周小为 等. 用于大尺寸衍射光栅的光刻胶残余物的灰化系统研制[J]. 真空, 2008, 45(3): 25~27
Hong Yilin, Liu Liangbao, Zhou Xiaowei et al.. Development of plasma photoresist descum system for large-aperture diffraction gratings[J]. Vacuum, 2008, 45(3): 25~27
[7] 徐朝银, 董晓浩, 赵飞云 等. KZ-400离子束刻蚀装置的研制[J]. 真空科学与技术学报, 2006, 26(1): 48~53
Xu Chaoyin, Dong Xiaohao, Zhao Feiyun et al.. Development of KZ-400 ion beam etching facility[J]. Vacuum Science and Technology, 2006, 26(1): 48~53
[8] 汪海宾, 刘全, 吴建宏. Ar+离子束刻蚀制作凸面闪耀光栅[J]. 光学学报, 2011, 31(4): 0405002
[9] N. Destouches, H. P. Herzig, W. Nakagawa et al.. AFM benchmark for the profile characteristation of subwavelength diffractive elements within the EC Network of Excellence on Micro-Optics(NEMO)[C]. SPIE, 2006, 6188: 61881k
徐向东, 刘正坤, 邱克强, 刘颖, 洪义麟, 付绍军. 角分辨光电子能谱光束线1200 line/mm光栅研制[J]. 光学学报, 2011, 31(10): 1005008. Xu Xiangdong, Liu Zhengkun, Qiu Keqiang, Liu Ying, Hong Yilin, Fu Shaojun. Fabrication of 1200 line/mm Laminar Grating for ARPES[J]. Acta Optica Sinica, 2011, 31(10): 1005008.