熔石英表面加工引入金属微粒的三倍频激光损伤机制
欧阳升, 刘志超, 许乔. 熔石英表面加工引入金属微粒的三倍频激光损伤机制[J]. 强激光与粒子束, 2011, 23(9): 2423.
Ouyang Sheng, Liu Zhichao, Xu Qiao. Mechanism of thirdharmonic laserinduced damage on fused silica surface with processingintroduced metal absorbers[J]. High Power Laser and Particle Beams, 2011, 23(9): 2423.
[1] Arlee V S, Binh T D. Picosecondnanosecond bulk damage of fused silica at 1 064 nm[C]//Proc of SPIE. 2009:71321E.
[2] Kozlowski M R, Carr J, Hutcheon I, et al. Depth profiling of polishinginduced contamination on fused silica surface[C]//Proc of SPIE. 1997,3244:365375.
[3] Neauport J, Lamaignere L, Bercegol H. Polishinginduced contamination of fused silica optics and laser induced damage density at 351 nm[J].Opt Express,2005,13(25):1016310165.
[4] Stuart B C, Feit M D, Herman S, et al. Nanosecondtofemtosecond laserinduced breakdown in dielectrics[J].Phys Rev B,1996,53(3):17491754.
[5] Papernov S, Schmid A W. Correlations between embedded single gold nanoparticles in SiO2 thin film and nanoscale crater formation induced by pulselaser radiation[J].J Appl Phys,2002,92(18):57205728.
[6] Rubenchik A M, Feit M D. Initiation, growth and mitigation of UV laser induced damage in fused silica[C]//Proc of SPIE.2001,4679:7995.
[7] Bude J, Guss G, Matthews M, et al. The effect of lattice temperature on surface damage in fused silica optics[C]//Proc of SPIE.2008,672009.
[8] Hicks D G, Boehly T R, Eggert J H, et al. Dissociation of liquid silica at high pressures and temperatures[J].Phys Rev Lett,2006,97:025502.
[9] 刘志超,许乔,欧阳升,等. 熔石英紫外激光初始损伤形态分析[J]. 强激光与粒子束,2009,21(7):10271031.(Liu Zhichao, Xu Qiao, Ouyang Sheng, et al. Morphology of UV laser initiated damage in fused silica.High Power Laser and Particle Beams,2009,21(7):10271031)
欧阳升, 刘志超, 许乔. 熔石英表面加工引入金属微粒的三倍频激光损伤机制[J]. 强激光与粒子束, 2011, 23(9): 2423. Ouyang Sheng, Liu Zhichao, Xu Qiao. Mechanism of thirdharmonic laserinduced damage on fused silica surface with processingintroduced metal absorbers[J]. High Power Laser and Particle Beams, 2011, 23(9): 2423.