电子光学系统是毫米波速调管长寿命和整管性能实现的关键，毫米波速调管零件尺寸较小，为了在Ka波段和W波段实现千瓦量级的输出功率，要求具有高的电子注通过率及低的阴极负荷。对Ka波段和W波段电子光学系统特性进行了分析，确定了Ka波段10 kW分布作用速调管和W波段1 kW分布作用速调管电子光学系统的设计方案，利用软件对电子枪和聚焦系统的结构进行计算，并采用CST仿真软件对设计的电子枪发射的电子注在聚焦磁场中的状态进行优化。设计出的Ka波段速调管电子光学系统，电子枪工作电压26 kV，发射电流2 A，互作用区长度30 mm，磁场强度大于0.6 T，流通达到100%。设计的W波段速调管电子光学系统，电子枪工作电压17 kV，电流0.65 A，互作用区长度20 mm，磁场大于0.9 T，流通达到100%。已制成Ka波段速调管和W波段速调管，设计的电子光学系统能够满足速调管工程化需求。

In millimeter wave klystron, the electron optics system is very important. The electron optics system is related to the realization and the life time of the klystron. The size of millimeter wave klystron is small. To achieve kW output power in Ka-band and W-band, the higher electron passing rate and lower cathode load are required. The paper analyzes the characteristics of electron optics system for Ka-band and W-band klystron. The design schemes of Ka-band 10 kW klystron and W- band 1 kW klystron are determined. The structures of electron gun and focusing system are calculated by software, and the state of electron gun in focusing magnetic field is optimized by CST. Ka-band klystron and W-band klystron have been made, and the electron optical system designed can meet the requirement of engineering realization of klystron.