发光学报, 2012, 33 (5): 525, 网络出版: 2012-06-11   

980 nm半导体激光器腔面膜钝化新技术

The Novel Passivation Method for 980 nm Semiconductor Laser Diode Face Coating
作者单位
1 长春理工大学 高功率半导体激光国家重点实验室, 吉林 长春130022
2 中国科学院 长春光学精密机械与物理研究所, 吉林 长春130033
引用该论文

李再金, 李特, 芦鹏, 曲轶, 薄报学, 刘国军, 王立军. 980 nm半导体激光器腔面膜钝化新技术[J]. 发光学报, 2012, 33(5): 525.

LI Zaijin, LI Te, LU Peng, QU Yi, BO Baoxue, LIU Guojun, WANG Lijun. The Novel Passivation Method for 980 nm Semiconductor Laser Diode Face Coating[J]. Chinese Journal of Luminescence, 2012, 33(5): 525.

参考文献

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李再金, 李特, 芦鹏, 曲轶, 薄报学, 刘国军, 王立军. 980 nm半导体激光器腔面膜钝化新技术[J]. 发光学报, 2012, 33(5): 525. LI Zaijin, LI Te, LU Peng, QU Yi, BO Baoxue, LIU Guojun, WANG Lijun. The Novel Passivation Method for 980 nm Semiconductor Laser Diode Face Coating[J]. Chinese Journal of Luminescence, 2012, 33(5): 525.

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