在超分辨光存储技术中，掩膜层材料是决定其性能优劣的关键。In薄膜可以作为掩膜层用来实现超分辨信息点的动态读出。采用直流磁控溅射法制备不同厚度的In薄膜，用台阶仪测量薄膜厚度随时间的变化关系，用原子力显微镜观察不同厚度薄膜样品的表面形貌。在预刻有尺寸为390 nm信息点的光盘盘基上制备In薄膜，从而形成In掩膜超分辨光盘。利用光盘动态测试仪进行动态读出，最高读出载噪比(CNR)达到26 dB。为了进一步分析超分辨动态读出的物理机理，采用变温椭圆偏振光谱仪测量In薄膜在不同温度下的光学常数，得到In薄膜在不同温度下的反射率和吸收系数。分析表明In掩膜超分辨光盘的读出机理符合孔径型超分辨读出模型。

The key performance of super-resolution optical disk storage technique is mainly determined by the mask material. In this work, the super resolution pits on the optical disk are dynamically read out with indium thin film as a functional mask layer. Thin films with different thicknesses are deposited by direct current magnetron sputtering method, the thickness changes with time of the In thin films are measured by profilometer and the different surface morphologies are observed by atomic force microscopy. In thin film in the pre-engraved super-resolution optical disk with pit size of 390 nm is created to form the In mask super-resolution optical disk. The readout is tested by the optical disk dynamic tester, and the largest carrier to noise ratio (CNR) of 26 dB is obtained. To explore the internal mechanism of this super-resolution readout ability, the optical constant under different temperatures is studied by variable temperature ellipsometer. The reflectivity and absorption coefficiency are also obtained. The experimental results indicate that the mechanism of the super-resolution readout with In thin film as mask can be explained by the model of aperture-type super-resolution.