光学学报, 1985, 5 (7): 619, 网络出版: 2011-09-16
椭偏测量中反射率对于膜厚变化的灵敏度因子
Sensitivity factor of reflectance to the change of film thickness in ellipsometry
摘要
本文推导了环境-膜-基底系统的反射率对于膜厚变化的灵敏度因子公式,利用计算机对三个不同的膜进行了模拟计算,得出了该灵敏度因子对于入射角的依赖关系曲线,并以此为基础讨论了椭偏测量中入射角的选择问题。
Abstract
The formula for the sensitivity factor of reflectance of ambience-film-substrate systems to the change of film thickness is derived. Computer simulation is carried out for three different systems, and curves representing the dependence of the sensitivity factor on the angle of incidence are presented. A discussion for the choice of the angle of incidence in ellipsometry based upon results of computer simulation is given.
王志刚, 丁兰英. 椭偏测量中反射率对于膜厚变化的灵敏度因子[J]. 光学学报, 1985, 5(7): 619. WANG ZHIGANG, DING LANTING. Sensitivity factor of reflectance to the change of film thickness in ellipsometry[J]. Acta Optica Sinica, 1985, 5(7): 619.