[1] F. Duerinckx, I. K. Filipek, K. V. Nieuwenhuysen et al.. Simulation and implementation of a porous silicon reflector for epitaxial silicon solar cells［J］. Prog. Photovolt：Res. Appl., 2008, 16(5): 399～407

[2] M. Ghannam, A. Abouelsaood, I. Kuzma et al.. Optical modeling of capped multi-layer porous silicon as a back reflector in thin-film solar cells［C］. Proceedings of the IEEE 4th World Conference on Photovoltaic Energy Conversion, Hawaii, 2006, 1362～1364

[3] I. K. Filipek, K. V. Nieuwenhuysen, J.V. Hoeymissen et al.. Short-circuit current densities exceeding 30 mA/cm2 by use of chirped porous-silicon reflectors and shallow emitters in thin-film (20-μm) epitaxial silicon solar cells［J］. IEEE Electron Device Lett., 2009, 30(5): 499～501

[4] 王福贞, 马文存. 气相沉积应用技术［M］. 北京：机械工业出版社，2007

    Wang Fuzhen, Ma Wencun. Vapour Deposition Application Technology［M］. Beijing: China Machine Press, 2007

[5] L.Zeng, Y. Yi, C. Hong et al.. Efficiency enhancement in Si solar cells by textured photonic crystal back reflector［J］. Appl. Phys. Lett., 2006, 89(11): 111111

[6] M. Mansuripur, G. A. Neville Connell, J. W. Goodman. Laser-induced local heating of multilayers［J］. Appl. Opt., 1982, 21(6): 1106～1112

[7] 卢宝文, 徐学科, 余祥 等. 不同沉积速率下热蒸发银膜的光学性能和结构分析［J］. 光学学报, 2010, 30(1): 283～286

    Lu Baowen, Xu Xueke, Yu Xiang et al.. Optical properties and structures of silver thin films deposited by thermal evaporation with different deposition rate［J］. Acta Optica Sinica, 2010, 30(1): 283～286

[8] 白亮, 朱京涛, 徐敬 等. 30.4 nm波长处Mg基多层膜反射镜［J］. 光学学报, 2009, 29(9): 2615～2618

    Bai Liang, Zhu Jingtao, Xu Jing et al.. Multilayer film reflective mirror at 30.4 nm ［J］. Acta Optica Sinica, 2009, 29(9): 2615～2618

[9] 薛春荣, 易葵, 邵建达 等. 193 nm氟化物高反膜研究［J］. 中国激光, 2010, 37(8): 2068～2072

    Xue Chunrong, Yi Kui, Shao Jianda et al.. 193 nm fluoride high reflection mirror［J］. Chinese J. Lasers, 2010, 37(8): 2068～2072

[10] 朱京涛, 张淑敏, 王蓓 等. 30.4 nm波长SiC/Mg多层膜反射镜［J］. 光学学报, 2007, 27(4): 735～738

    Zhu Jingtao, Zhang Shumin, Wang Bei et al.. SiC/Mg multiayer film reflective mirror at 30.4 nm［J］. Acta Optica Sinica, 2007, 27(4): 735～738

[11] M. Hofmann, C. Schmidt, N. Kohn et al.. Stack system of PECVD amorphous silicon and PECVD silicon oxide for silicon solar cell rear side passivation［J］. Progress in Photovoltaics., 2008, 16(6): 509～518

[12] B. R. Wu, D. S. Wuu, M. S. Wan et al.. Fabrication of nc-Si/c-Si solar cells using hot-wire chemical vapor deposition and laser annealing［J］. Solar Energy Materials and Solar Cells., 2009, 93(6-7): 993～995