以正硅酸乙酯作为前驱体,乙醇作为溶剂,氨水作为催化剂,在碱催化体系下制备了高分散的SiO₂溶胶;然后采用提拉法在不同浓度的SiO₂溶胶涂膜液中制备了四倍频266 nm波长增透的SiO₂减反膜,并对各膜层的性能进行了测试。测试结果表明:在浓度最大的SiO₂溶胶中以4.5 cm·min ^-1的提拉速度制备得到的四倍频SiO₂减反膜的性能最优,其在266 nm处的透过率达到了99.307%,表面粗糙度为1.339 nm,且透过率稳定性优异。

Highly dispersed silica (SiO₂) sol was prepared in a basic catalyst system using tetraethoxysilane, ethanol, and ammonium hydroxide as the precursor, solvent, and catalyst, respectively. SiO₂ antireflective films with fourth harmonic generation antireflection at 266 nm were prepared by dip coating each film in different concentrations of SiO₂ sol, and the properties of the as-prepared film were determined. Results show that the fabricated film pulled up at a speed of 4.5 cm·min ^-1 from the highest concentration SiO₂ sol exhibited the best performance. The film was characterized by a maximum transmittance of 99.307% at 266 nm, surface roughness of 1.339 nm, and excellent stability.